2025 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)

Book title Buchtitel
2025 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
 
ISBN
979-8-3315-4883-4
 
Publisher Verlag
IEEE
 
DOI
10.1109/SISPAD66650.2025
 

Publications Publikationen

Results 1-10 of 10 (Search time: 0.003 seconds).

PreviewAuthor(s)TitleTypeIssue Date
1Gull, Josef ; Filipovic, Lado ; Kosina, Hans Accurate Carrier Dynamics for a Kane Dispersion RelationInproceedings Konferenzbeitrag 28-Oct-2025
2Fu, Yihao ; Shao, Hua ; Xia, Longrui ; Ge, Rui ; Bai, Lang ; He, Xiaobin ; Junjie Li ; Chen, Rui ; Wei, Yayi ; Li, Ling ; Filipovic, Lado Atomic-Level Monte Carlo Modeling of SiN Deposition by PECVDInproceedings Konferenzbeitrag 2025
3Yuki, Ohuchi ; Stella, Robert ; Filipovic, Lado Development of a Gaussian Approximation Potential for Gan With Point Defects and Mg ImpuritiesInproceedings Konferenzbeitrag 2025
4Filipovic, Lado From Atoms to Reactors: Multi-Scale Modeling for Semiconductor FabricationInproceedings Konferenzbeitrag 2025
5Boschetto, G. ; Wilhelmer, Christoph ; Cvitkovich, Lukas ; Li, J. ; Waldhör, Dominic ; Grasser, Tibor ; Martinez, B. Multi-Scale Simulation Framework for the Modelling of Charge Capture and Emission in Spin Qubit DevicesInproceedings Konferenzbeitrag 2025
6Kostal, Roman ; Reiter, Tobias ; Filipovic, Lado A New Module for Automated Optimization of Process TCAD Model ParametersInproceedings Konferenzbeitrag 28-Oct-2025
7Stella, Robert ; Leroch, Sabine ; Reiter, Tobias ; Hössinger, Andreas ; Filipovic, Lado Physics-Based Multi-Scale Modeling of Angled Reactive Ion EtchingInproceedings Konferenzbeitrag 28-Oct-2025
8Hu, Ziyi ; Junjie Li ; Shao, Hua ; Chen, Rui ; Filipovic, Lado ; Li, Ling Physics-Informed Bayesian Optimization Framework for Etching Rate and Surface Roughness Co-OptimizationInproceedings Konferenzbeitrag 28-Oct-2025
9Reiter, Tobias ; Toifl, Alexander ; Hossinger, Andreas ; Filipovic, Lado Simulation of a Polymer-Free Drie Process Using SF₆/O₂ Plasma EtchingInproceedings Konferenzbeitrag 28-Oct-2025
10Ghosh, Rittik ; Provias, Alexandros ; Karl, Alexander ; Chaudhuri, Rajarshi Roy ; Waldhör, Dominic ; Knobloch, Theresia ; Wilhelmer, Christoph ; Grasser, Tibor Unveiling Fast Interface Trap Dynamics in Monolayer MoS₂ FETsInproceedings Konferenzbeitrag 28-Oct-2025