Title Titel
Applied Surface Science
 
e-ISSN
1873-5584
 
ISSN
0169-4332
 
Publisher Herausgeber
ELSEVIER
 
Publisher's Address Herausgeber Adresse
RADARWEG 29, AMSTERDAM, Netherlands, 1043 NX
 
Listed in SCI Aufgelistet im SCI
 
Peer reviewed Begutachtet
 
 

Publications Publikationen

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Subject:  General Chemistry

Results 1-20 of 34 (Search time: 0.003 seconds).

PreviewAuthor(s)TitleTypeIssue Date
1Schuster, Monika ; Turecek, Claudia ; Varga, Franz ; Lichtenegger, Helga ; Stampfl, Jürgen ; Liska, Robert 3D-shaping of biodegradable photopolymers for hard tissue replacementArtikel Article2007
2Kubicek, Markus ; Holzlechner, Gerald ; Opitz, Alexander K. ; Larisegger, Silvia ; Hutter, Herbert ; Fleig, Jürgen A novel ToF-SIMS operation mode for sub 100 nm lateral resolution: Application and performanceArtikel Article2014
3Safari, F. ; Moradinasab, M. ; Fathipour, M. ; Kosina, H. Adsorption of the NH3, NO, NO2, CO2, and CO Gas Molecules on Blue Phosphorene: A First-Principles StudyArtikel Article 2019
4Bilo, Fabjola ; Borgese, Laura ; Prost, Josef ; Rauwolf, Mirjam ; Turyanskaya, Anna ; Wobrauschek, Peter ; Kregsamer, Peter ; Streli, Christina ; Pazzaglia, Ugo ; Depero, Laura E. Atomic layer deposition to prevent metal transfer from implants: an X-Ray Fluorescence studyArtikel Article 2015
5Götsch, Thomas ; Schachinger, Thomas ; Stöger-Pollach, Michael ; Kaindl, Reinhard ; Penner, Simon Carbon tolerance of Ni-Cu and Ni-Cu/YSZ sub- m sized SOFC thinfilm model systemsArtikel Article 2017
6Gachot, Carsten ; Catrin, Rodolphe ; Lasagni, Andrés ; Schmid, Ulrich ; Mücklich, Frank Comparative study of grain sizes and orientation in microstructured Au, Pt and W thin films designed by laser interference metallurgyArtikel Article 2009
7Götsch, Thomas ; Hauser, Daniel ; Köpfle, Norbert ; Bernardi, Johannes ; Klötzer, Bernhard ; Penner, Simon Complex oxide thin films: Pyrochlore, defect fluorite and perovskite model systems for structural, spectroscopic and catalytic studiesArtikel Article 2018
8Yao, Jizheng ; Li, Ni ; Grothe, Hinrich ; Qi, Zhenhui ; Dong, Chaofang Determination of the hydrogen effects on the passive film and the micro-structure at the surface of 2205 duplex stainless steelArtikel Article 2021
9Rodríguez Ripoll, Manel ; Totolin, Vladimir ; Gabler, Christoph ; Bernardi, Johannes ; Minami, Ichiro Diallyl disulphide as natural organosulphur friction modifier via the in-situ tribo-chemical formation of tungsten disulphideArtikel Article 2018
10Ali, Nisar ; Bashir, Shazia ; Umm-I-Kalsoom ; Begum, Narjis ; Rafique, Muhammad Shahid ; Husinsky, Wolfgang Effect of liquid environment on the titanium surface modification by laser ablationArtikel Article 20-Feb-2017
11Gillinger, M. ; Shaposhnikov, K. ; Knobloch, T. ; Stöger-Pollach, M. ; Artner, W. ; Hradil, K. ; Schneider, M. ; Kaltenbacher, M. ; Schmid, U. Enhanced c-axis orientation of aluminum nitride thin films by plasma-based pre-conditioning of sapphire substrates for SAW applicationsArtikel Article 2018
12Eberl, Christian ; Döring, Florian ; Liese, Tobias ; Schlenkrich, Felix ; Roos, Burkhard ; Hahn, Matthias ; Hoinkes, Thomas ; Rauschenbeutel, Arno ; Osterhoff, Markus ; Salditt, Tim ; Krebs, Hans-Ulrich Fabrication of laser deposited high-quality multilayer zone plates for hard X-ray nanofocussingArtikel Article2014
13Daskalova, A. ; Nathala, Chandra S.R. ; Kavatzikidou, P. ; Ranella, A. ; Szoszkiewicz, R. ; Husinsky, W. ; Fotakis, C. Fs laser processing of bio-polymer thin films for studying cell-to-substrate specific responseArtikel Article 2016
14Infuehr, Robert ; Pucher, Niklas ; Heller, Christian ; Lichtenegger, Helga ; Liska, Robert ; Schmidt, Volker ; Kuna, Ladislav ; Haase, Anja ; Stampfl, Jürgen Functional polymers by two-photon 3D lithographyArtikel Article2007
15Dergez, D. ; Schalko, J. ; Bittner, A. ; Schmid, U. Fundamental properties of a-SiNx:H thin films deposited by ICP-PECVD for MEMS applicationsArtikel Article2013
16Gloss, Jonas ; Horký, Michal ; Křižáková, Viola ; Flajšman, Lukáš ; Schmid, Michael ; Urbánek, Michal ; Varga, Peter The growth of metastable fcc Fe₇₈Ni₂₂ thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterningArtikel Article 2019
17Grosser, M. ; Münch, M. ; Seidel, Helmut ; Bienert, C. ; Roosen, A. ; Schmid, Ulrich The impact of substrate properties and thermal annealing on tantalum nitride thin filmsArtikel Article 2012
18Zimmermann, C. ; Bethge, O. ; Winkler, K. ; Lutzer, B. ; Bertagnolli, E. Improving the ALD-grown Y2O3/Ge interface quality bysurface and annealing treatmentsArtikel Article 2016
19Bittner, A. ; Ababneh, A. ; Seidel, H. ; Schmid, U. Influence of the crystal orientation on the electrical properties of AlN thin films on LTCC substratesArtikel Article2010
20Soldera, F. ; Burdiles, G. ; Schmid, U. ; Seidel, H. ; Mücklich, F. Investigation of the Interaction between Electrical Discharges and Low Resistivity Silicon SubstratesArtikel Article2008