Materials Science in Semiconductor Processing

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Journal description

Title Titel
Materials Science in Semiconductor Processing
 
e-ISSN
1873-4081
 
ISSN
1369-8001
 
Publisher Herausgeber
ELSEVIER SCI LTD
 
Publisher's Address Herausgeber Adresse
125 London Wall, London, England, EC2Y 5AS
 
Listed in SCI Aufgelistet im SCI
 
Peer reviewed Begutachtet
 
 

Publications Publikationen

Results 1-7 of 7 (Search time: 0.002 seconds).

PreviewAuthor(s)TitleTypeIssue Date
1Shawrav, M.M. ; Gökdeniz, Z.G. ; Wanzenboeck, H.D. ; Taus, P. ; Mika, J.K. ; Waid, S. ; Bertagnolli, E. Chlorine based focused electron beam induced etching: A novel way to pattern germaniumArtikel Article 2016
2Tyaginov, S.E. ; Vexler, M.I. ; El Hdiy, A. ; Gacem, K. ; Zaporojtchenko, V. Electrical Methods for Estimating the Correlation Length of Insulator Thickness Fluctuations in MIS Tunnel StructuresArtikel Article2010
3Triendl, F. ; Pfusterschmied, G. ; Pobegen, G. ; Schwarz, S. ; Artner, W. ; Konrath, J.P. ; Schmid, U. Growth and characterization of low pressure chemical vapor deposited Si on Si-face 4H-SiCArtikel Article 2021
4Pfusterschmied, G. ; Triendl, F. ; Schneider, M. ; Schmid, U. Impact of Ar+ bombardment of 4H-SiC substrates on Schottky diode barrier heightsArtikel Article 2021
5Gillinger, Manuel ; Knobloch, Theresia ; Markovic, A. ; Pfusterschmied, Georg ; Schneider, Michael ; Schmid, Ulrich Performance of thin AlxOy, SixNy and AlN passivation layers for high temperature SAW device applicationsArtikel Article Jul-2018
6Triendl, F. ; Pfusterschmied, G. ; Schwarz, S. ; Artner, W. ; Schmid, U. Si/4H-SiC heterostructure formation using metal-induced crystallizationArtikel Article 2021
7Fischeneder, M. ; Wistrela, E. ; Bittner, A. ; Schneider, M. ; Schmid, U. Tailored wafer holder for a reliable deposition of sputtered aluminium nitride thin films at low temperaturesArtikel Article 2017