Materials Science in Semiconductor Processing

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Journal description

Title Titel
Materials Science in Semiconductor Processing
 
e-ISSN
1873-4081
 
ISSN
1369-8001
 
Publisher Herausgeber
ELSEVIER SCI LTD
 
Publisher's Address Herausgeber Adresse
125 London Wall, London, England, EC2Y 5AS
 
Listed in SCI Aufgelistet im SCI
 
Peer reviewed Begutachtet
 
 

Publications Publikationen

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Author:  Triendl, F.

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PreviewAuthor(s)TitleTypeIssue Date
1Triendl, F. ; Pfusterschmied, G. ; Pobegen, G. ; Schwarz, S. ; Artner, W. ; Konrath, J.P. ; Schmid, U. Growth and characterization of low pressure chemical vapor deposited Si on Si-face 4H-SiCArtikel Article 2021
2Pfusterschmied, G. ; Triendl, F. ; Schneider, M. ; Schmid, U. Impact of Ar+ bombardment of 4H-SiC substrates on Schottky diode barrier heightsArtikel Article 2021
3Triendl, F. ; Pfusterschmied, G. ; Schwarz, S. ; Artner, W. ; Schmid, U. Si/4H-SiC heterostructure formation using metal-induced crystallizationArtikel Article 2021