Name Card

Full name Familienname, Vorname
Maurer, Daniel
 

Own Publications Eigene Publikationen

Results 1-7 of 7 (Search time: 0.001 seconds).

PreviewAuthor(s)TitleTypeIssue Date
1Zahel, Thomas ; Hauer, Stefan ; Mueller, Eric ; Murphy, Patrick ; Abad, Sandra ; Vasilieva, Elena ; Maurer, Daniel ; Brocard, Cécile ; Reinisch, Daniela ; Sagmeister, Patrick ; Herwig, Christoph Integrated Process Modeling-A Process Validation Life Cycle CompanionArtikel Article 2017
2Zahel, Thomas ; Marschall, Lukas ; Abad, Sandra ; Vasilieva, Elena ; Maurer, Daniel ; Mueller, Eric ; Murphy, Patrick ; Natschläger, Thomas ; Brocard, Cécile ; Reinisch, Daniela ; Sagmeister, Patrick ; Herwig, Christoph Workflow for Criticality Assessment Applied in Biopharmaceutical Process Validation Stage 1Artikel Article 2017
3Frischmuth, Tobias ; Schneider, Michael ; Maurer, Daniel ; Grille, Thomas ; Schmid, Ulrich Inductively-coupled plasma-enhanced chemical vapour deposition ofhydrogenated amorphous silicon carbide thin films for MEMSArtikel Article 2016
4Frischmuth, Tobias ; Schneider, Michael ; Bogdanović Radović, Iva ; Siketić, Zdravko ; Maurer, Daniel ; Grille, Thomas ; Schmid, Ulrich Lowtemperature deposition of a-SiC:H thin films applying a dual plasma source processArtikel Article 2016
5Frischmuth, Tobias ; Schneider, Michael ; Maurer, Daniel ; Grille, Thomas ; Schmid, Ulrich High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin filmsArtikel Article 2016
6Frischmuth, Tobias ; Schneider, Michael ; Maurer, Daniel ; Grille, Thomas ; Schmid, Ulrich Impact of thermal treatment on the residual stress and Young's modulus of thin a-SiC:H membranes applying bulge testingKonferenzbeitrag Inproceedings2015
7Frischmuth, Tobias ; Maurer, Daniel ; Schneider, Michael ; Grille, Thomas ; Schmid, Ulrich IMPACT OF SUBSTRATE TEMPERATURE AND INDUCTIVELY COUPLED PLASMA POWER ON a-SiC:H THIN FILM PROPERTIESKonferenzbeitrag Inproceedings2015