Wissenschaftliche Artikel

Saleh, A. S., Croes, K., Ceric, H., De Wolf, I., & Zahedmanesh, H. (2025). Novel concept-oriented synthetic data approach for training generative AI-Driven crystal grain analysis using diffusion model. Computational Materials Science, 251, Article 113723. https://doi.org/10.1016/j.commatsci.2025.113723 ( reposiTUm)
Saleh, A. S., Croes, K., Ceric, H., De Wolf, I., & Zahedmanesh, H. (2024). A Comprehensive Microstructure-Aware Electromigration Modeling Framework; Investigation of the Impact of Trench Dimensions in Damascene Copper Interconnects. Nanomaterials, 14(22), 1–15. https://doi.org/10.3390/nano14221834 ( reposiTUm)
Ceric, H., Lacerda de Orio, R., & Selberherr, S. (2023). Statistical Study of Electromigration in Gold Interconnects. Microelectronics Reliability, 147, 1–7. https://doi.org/10.1016/j.microrel.2023.115061 ( reposiTUm)
Ceric, H., Lacerda de Orio, R., & Selberherr, S. (2023). Microstructural impact on electromigration reliability of gold interconnects. Solid-State Electronics, 200, Article 108528. https://doi.org/10.1016/j.sse.2022.108528 ( reposiTUm)
Ceric, H., Zahedmanesh, H., Croes, K., Lacerda de Orio, R., & Selberherr, S. (2023). Electromigration-Induced Void Evolution and Failure of Cu/SiCN Hybrid Bonds. Journal of Applied Physics, 133(10), Article 105101. https://doi.org/10.1063/5.0134692 ( reposiTUm)
Saleh, A. S., Croes, K., Ceric, H., De Wolf, I., & Zahedmanesh, H. (2023). A framework for combined simulations of electromigration induced stress evolution, void nucleation, and its dynamics: Application to nano-interconnect reliability. Journal of Applied Physics, 134(13), 1–12. https://doi.org/10.1063/5.0165949 ( reposiTUm)
Saleh, A., Ceric, H., & Zahedmanesh, H. (2021). Void-Dynamics in Nano-Wires and the Role of Microstructure Investigated via a Multi-Scale Physics-Based Model. Journal of Applied Physics, 129(12), 125102. https://doi.org/10.1063/5.0039953 ( reposiTUm)
Ceric, H., Selberherr, S., Zahedmanesh, H., de Orio, R. L., & Croes, K. (2021). Review - Modeling Methods for Analysis of Electromigration Degradation in Nano-Interconnects. ECS Journal of Solid State Science and Technology, 10(3), 035003. https://doi.org/10.1149/2162-8777/abe7a9 ( reposiTUm)
Grill, A., Stampfer, B., Im, K.-S., Lee, J.-H., Ostermaier, C., Ceric, H., Waltl, M., & Grasser, T. (2019). Electrostatic Coupling and Identification of Single-Defects in GaN/AlGaN Fin-MIS-HEMTs. Solid-State Electronics, 156, 41–47. https://doi.org/10.1016/j.sse.2019.02.004 ( reposiTUm)
Ceric, H., Zahedmanesh, H., & Croes, K. (2019). Analysis of Electromigration Failure of Nano-Interconnects through a Combination of Modeling and Experimental Methods. Microelectronics Reliability, 100–101(113362), 113362. https://doi.org/10.1016/j.microrel.2019.06.054 ( reposiTUm)
Papaleo, S., Zisser, W. H., Singulani, A. P., Ceric, H., & Selberherr, S. (2016). Stress Evolution During Nanoindentation in Open TSVs. IEEE Transactions on Device and Materials Reliability, 16(4), 470–474. https://doi.org/10.1109/tdmr.2016.2622727 ( reposiTUm)
Sharma, P., Tyaginov, S., Jech, M., Wimmer, Y., Rudolf, F., Enichlmair, H., Park, J.-M., Ceric, H., & Grasser, T. (2016). The Role of Cold Carriers and the Multiple-Carrier Process of Si-H Bond Dissociation for Hot-Carrier Degradation in n- and p-channel LDMOS Devices. Solid-State Electronics, 115, 185–191. https://doi.org/10.1016/j.sse.2015.08.014 ( reposiTUm)
Coppeta, R. A., Holec, D., Ceric, H., & Grasser, T. (2015). Evaluation of Dislocation Energy in Thin Films. Philosophical Magazine, 95(2), 186–209. https://doi.org/10.1080/14786435.2014.994573 ( reposiTUm)
Sharma, P., Tyaginov, S. E., Wimmer, Y., Rudolf, F., Rupp, K., Bina, M., Enichlmair, H., Park, J. M., Minixhofer, R., Ceric, H., & Grasser, T. (2015). Modeling of Hot-Carrier Degradation in nLDMOS Devices: Different Approaches to the Solution of the Boltzmann Transport Equation. IEEE Transactions on Electron Devices, 62(6), 1811–1818. https://doi.org/10.1109/ted.2015.2421282 ( reposiTUm)
Sharma, P., Tyaginov, S., Wimmer, Y., Rudolf, F., Rupp, K., Enichlmair, H., Park, J.-M., Ceric, H., & Grasser, T. (2015). Comparison of Analytic Distribution Function Models for Hot-Carrier Degradation in nLDMOSFETs. Microelectronics Reliability, 55(9–10), 1427–1432. https://doi.org/10.1016/j.microrel.2015.06.021 ( reposiTUm)
Ceric, H., Orio, R., Zisser, W., & Selberherr, S. (2014). Microstructural Impact on Electromigration: A TCAD Study. Facta Universitatis - Series: Electronics and Energetics, 27(1), 1–11. https://doi.org/10.2298/fuee1401001c ( reposiTUm)
Zisser, W. H., Ceric, H., Weinbub, J., & Selberherr, S. (2014). Electromigration Reliability of Open TSV Structures. Microelectronics Reliability, 54(9–10), 2133–2137. https://doi.org/10.1016/j.microrel.2014.07.099 ( reposiTUm)
Singulani, A. P., Ceric, H., & Selberherr, S. (2013). Stress Evolution in the Metal Layers of TSVs with Bosch Scallops. Microelectronics Reliability, 53(9–11), 1602–1605. https://doi.org/10.1016/j.microrel.2013.07.132 ( reposiTUm)
Ceric, H., de Orio, R. L., & Selberherr, S. (2012). Interconnect Reliability Dependence on Fast Diffusivity Paths. Microelectronics Reliability, 52(8), 1532–1538. https://doi.org/10.1016/j.microrel.2011.09.035 ( reposiTUm)
de Orio, R. L., Ceric, H., & Selberherr, S. (2012). Electromigration Failure in a Copper Dual-Damascene Structure with a Through Silicon Via. Microelectronics Reliability, 52(9–10), 1981–1986. https://doi.org/10.1016/j.microrel.2012.07.021 ( reposiTUm)
Starkov, I., Tyaginov, S., Enichlmair, H., Cervenka, J., Jungemann, C., Carniello, S., Park, J. M., Ceric, H., & Grasser, T. (2011). Hot-Carrier Degradation Caused Interface State Profile-Simulation versus Experiment. Journal of Vacuum Science & Technology B, 29(1), 01AB09. https://doi.org/10.1116/1.3534021 ( reposiTUm)
Ceric, H., & Selberherr, S. (2011). Electromigration in Submicron Interconnect Features of Integrated Circuits. Materials Science and Engineering: R: Reports, 71(5–6), 53–86. https://doi.org/10.1016/j.mser.2010.09.001 ( reposiTUm)
Starkov, I., Tyaginov, S., Enichlmair, H., Park, J. M., Ceric, H., & Grasser, T. (2011). Accurate Extraction of MOSFET Unstressed Interface State Spatial Distribution from Charge Pumping Measurements. Solid State Phenomena, 178–179, 267–272. https://doi.org/10.4028/www.scientific.net/ssp.178-179.267 ( reposiTUm)
Tyaginov, S., Starkov, I., Enichlmair, H., Jungemann, Ch., Park, J. M., Seebacher, E., Orio, R., Ceric, H., & Grasser, T. (2011). An Analytical Approach for Physical Modeling of Hot-Carrier Induced Degradation. Microelectronics Reliability, 51(9–11), 1525–1529. https://doi.org/10.1016/j.microrel.2011.07.089 ( reposiTUm)
de Orio, R. L., Ceric, H., & Selberherr, S. (2011). A Compact Model for Early Electromigration Failures of Copper Dual-Damascene Interconnects. Microelectronics Reliability, 51(9–11), 1573–1577. https://doi.org/10.1016/j.microrel.2011.07.049 ( reposiTUm)
Huang, R., Robl, W., Ceric, H., Detzel, T., & Dehm, G. (2010). Stress, Sheet Resistance, and Microstructure Evolution of Electroplated Cu Films During Self-Annealing. IEEE Transactions on Device and Materials Reliability, 10(1), 47–54. https://doi.org/10.1109/tdmr.2009.2032768 ( reposiTUm)
Huang, R., Taylor, A., Himmelsbach, S., Ceric, H., & Detzel, T. (2010). Apparatus for Measuring Local Stress of Metallic Films, Using an Array of Parallel Laser Beams during Rapid Thermal Processing. Measurement Science and Technology, 21(5), 55702–55710. http://hdl.handle.net/20.500.12708/168266 ( reposiTUm)
Tyaginov, S. E., Starkov, I., Triebl, O., Cervenka, J., Jungemann, C., Carniello, S., Park, J. M., Enichlmair, H., Karner, M., Kernstock, C., Seebacher, E., Minixhofer, R., Ceric, H., & Grasser, T. (2010). Interface Traps Density-of-States as a Vital Component for Hot-Carrier Degradation Modeling. Microelectronics Reliability, 50, 1267–1272. http://hdl.handle.net/20.500.12708/168176 ( reposiTUm)
De Orio, R. L., Ceric, H., & Selberherr, S. (2009). Analysis of Electromigration in Dual-Damascene Interconnect Structures. Journal of Integrated Circuits and Systems, 4(2), 67–72. https://doi.org/10.29292/jics.v4i2.300 ( reposiTUm)
Ceric, H., de Orio, R. L., Cervenka, J., & Selberherr, S. (2009). A Comprehensive TCAD Approach for Assessing Electromigration Reliability of Modern Interconnects. IEEE Transactions on Device and Materials Reliability, 9(1), 9–19. https://doi.org/10.1109/tdmr.2008.2000893 ( reposiTUm)
Ceric, H., & Selberherr, S. (2009). Editorial Preface to the Special Section on Electromigration Published in March 2009. IEEE Transactions on Device and Materials Reliability, 9(2), 103–103. https://doi.org/10.1109/tdmr.2009.2020086 ( reposiTUm)
Cervenka, J., Ceric, H., & Selberherr, S. (2008). Three-Dimensional Simulation of Sacrificial Etching. Microsystem Technologies, 14(4–5), 665–671. https://doi.org/10.1007/s00542-007-0491-1 ( reposiTUm)
Lacerda de Orio, R., Ceric, H., & Selberherr, S. (2008). Effect of Strains on Anisotropic Material Transport in Copper Interconnect Structures under Electromigration Stress. Journal of Computational Electronics, 7(3), 128–131. https://doi.org/10.1007/s10825-008-0211-9 ( reposiTUm)
Movahhedi, M., Abdipour, A., Ceric, H., Sheikholeslami, A., & Selberherr, S. (2007). Optimization of the Perfectly Matched Layer for the Finite-Element Time-Domain Method. IEEE Microwave and Wireless Components Letters, 17(1), 10–12. https://doi.org/10.1109/lmwc.2006.887240 ( reposiTUm)

Beiträge in Tagungsbänden

Saleh, A. S., Croes, K., Ceric, H., De Wolf, I., & Zahedmanesh, H. (2024). Technology benchmarking of copper electromigration using a grain-sensitive simulation framework. In 2024 IEEE International Interconnect Technology Conference (IITC). 2024 IEEE International Interconnect Technology Conference (IITC), San Jose, United States of America (the). https://doi.org/10.1109/IITC61274.2024.10732543 ( reposiTUm)
Saleh, A. S., Zahedmanesh, H., Ceric, H., De Wolf, I., & Croes, K. (2023). Impact of via geometry and line extension on via-electromigration in nano-interconnects. In 2023 IEEE International Reliability Physics Symposium (IRPS) Proceedings. 2023 IEEE International Reliability Physics Symposium (IRPS), Monterey, United States of America (the). https://doi.org/10.1109/IRPS48203.2023.10118027 ( reposiTUm)
Ceric, H., de Orio, R. L., & Selberherr, S. (2022). Electromigration Degradation of Gold Interconnects: A Statistical Study. In 2022 IEEE International Interconnect Technology Conference (IITC). 2022 IEEE International Interconnect Technology Conference (IITC), San Jose, USA, United States of America (the). https://doi.org/10.1109/iitc52079.2022.9881313 ( reposiTUm)
Ceric, H., de Orio, R. L., & Selberherr, S. (2022). Microstructural Impact on Electromigration Reliability of Gold Interconnects. In SISPAD 2022: International Conference on Simulation of Semiconductor Processes and Devices - Conference Abstract Booklet (pp. 178–179). http://hdl.handle.net/20.500.12708/153576 ( reposiTUm)
Saleh, A. S., Zahedmanesh, H., Ceric, H., Croes, K., & De Wolf, I. (2022). Dynamics of Electromigration Voids in Cu Interconnects: Investigation Using a Physics-Based Model Augmented by Neural Networks. In 2022 IEEE International Interconnect Technology Conference (IITC). 2022 IEEE International Interconnect Technology Conference (IITC), San Jose, USA, United States of America (the). https://doi.org/10.1109/iitc52079.2022.9881303 ( reposiTUm)
Ceric, H., Orio, R., & Selberherr, S. (2022). Impact of Gold Interconnect Microstructure on Electromigration Failure Time Statistics. In Proceedings of the European Solid-State Device Research Conference (ESSDERC) (pp. 301–303). http://hdl.handle.net/20.500.12708/153548 ( reposiTUm)
Ceric, H., Lacerda de Orio, R., & Selberherr, S. (2022). Statistical Study of Electromigration in Gold Interconnects. In 2022 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA) (pp. 1–5). IEEE. https://doi.org/10.1109/IPFA55383.2022.9915762 ( reposiTUm)
Ceric, H., Selberherr, S., Zahedmanesh, H., Orio, R., & Croes, K. (2019). Assessment of Electromigration in Nano‐Interconnects. In Abstracts of the International Conference on Reliability and Stress-Related Phenomena in Nanoelectronics (IRSP) (p. 7). http://hdl.handle.net/20.500.12708/76788 ( reposiTUm)
Ceric, H., & Zahedmanesh, H. (2019). Advanced Modeling and Simulation of Cu Nano-Interconnects Reliability. In Proceedings of the International Interconnect Technology Conference (IITC). IEEE International Interconnect Technology Conference (IITC), Brüssel, Belgium. http://hdl.handle.net/20.500.12708/76791 ( reposiTUm)
Grill, A., Stampfer, B., Waltl, M., Im, K.-S., Lee, J.-H., Ostermaier, C., Ceric, H., & Grasser, T. (2017). Characterization and modeling of single defects in GaN/AlGaN fin-MIS-HEMTs. In 2017 IEEE International Reliability Physics Symposium (IRPS). IEEE International Reliability Physics Symposium (IRPS), Waikoloa, HI, USA, Non-EU. https://doi.org/10.1109/irps.2017.7936285 ( reposiTUm)
Ceric, H., Orio, R., & Rovitto, M. (2016). TCAD Approach for the Assessment of Interconnect Reliability. In Abstracts of the International Conference Reliability and Stress-Related Phenomena in Nanoelectronics - Experiment and Simulation (IRSP) (p. T21). http://hdl.handle.net/20.500.12708/75166 ( reposiTUm)
Papaleo, S., Rovitto, M., & Ceric, H. (2016). Mechanical Effects of the Volmer-Weber Growth in the TSV Sidewall. In 2016 IEEE 66th Electronic Components and Technology Conference (ECTC). IEEE Electronic Components and Technology Conference (ECTC), Las Vegas, United States of America (the). https://doi.org/10.1109/ectc.2016.19 ( reposiTUm)
Rovitto, M., & Ceric, H. (2016). Electromigration Induced Voiding and Resistance Change in Three-Dimensional Copper through Silicon Vias. In 2016 IEEE 66th Electronic Components and Technology Conference (ECTC). IEEE Electronic Components and Technology Conference (ECTC), Las Vegas, United States of America (the). https://doi.org/10.1109/ectc.2016.49 ( reposiTUm)
Papaleo, S., & Ceric, H. (2016). A finite element method study of delamination at the interface of the TSV interconnects. In 2016 IEEE International Reliability Physics Symposium (IRPS). International Reliability Physics Symposium (IRPS), Phoenix, United States of America (the). https://doi.org/10.1109/irps.2016.7574626 ( reposiTUm)
Ceric, H., & Rovitto, M. (2015). Impact of microstructure and current crowding on electromigration: A TCAD study. In 2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD). 2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Washington, DC, United States of America (the). IEEE. https://doi.org/10.1109/sispad.2015.7292292 ( reposiTUm)
Papaleo, S., Zisser, W. H., & Ceric, H. (2015). Factors that influence delamination at the bottom of open TSVs. In 2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD). 2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Washington, DC, United States of America (the). IEEE. https://doi.org/10.1109/sispad.2015.7292350 ( reposiTUm)
Sharma, P., Tyaginov, S., Wimmer, Y., Rudolf, F., Enichlmair, H., Park, J.-M., Ceric, H., & Grasser, T. (2015). A model for hot-carrier degradation in nLDMOS transistors based on the exact solution of the Boltzmann transport equation versus the drift-diffusion scheme. In EUROSOI-ULIS 2015: 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon. Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Bologna, Italy. IEEE. https://doi.org/10.1109/ulis.2015.7063763 ( reposiTUm)
Ceric, H., & Selberherr, S. (2015). Compact model for solder bump electromigration failure. In 2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM). International Interconnect Technology and Materials for Advanced Metallization Conference (IITC/MAM), Grenoble, France. https://doi.org/10.1109/iitc-mam.2015.7325651 ( reposiTUm)
Rovitto, M., Zisser, W. H., Ceric, H., & Grasser, T. (2015). Electromigration modelling of void nucleation in open Cu-TSVs. In 2015 16th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems. International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE), Ghent, Belgium. IEEE Xplore. https://doi.org/10.1109/eurosime.2015.7103100 ( reposiTUm)
Sharma, P., Tyaginov, S. E., Wimmer, Y., Rudolf, F., Rupp, K., Enichlmair, H., Park, J. M., Ceric, H., & Grasser, T. (2015). Comparison of Analytic Distribution Function Models for Hot-Carrier Degradation in nLDMOSFETs. In Abstracts of the 26#^{th} European Symposium on Reliability of Electron Devices, Failure Physics and Analysis (p. 60). http://hdl.handle.net/20.500.12708/74855 ( reposiTUm)
Grill, A., Rzepa, G., Lagger, P., Ostermaier, C., Ceric, H., & Grasser, T. (2015). Charge feedback mechanisms at forward threshold voltage stress in GaN/AlGaN HEMTs. In 2015 IEEE International Integrated Reliability Workshop (IIRW). IEEE International Reliability Workshop (IIRW), South Lake Tahoe, United States of America (the). https://doi.org/10.1109/iirw.2015.7437064 ( reposiTUm)
Sharma, P., Tyaginov, S., Wimmer, Y., Rudolf, F., Rupp, K., Bina, M., Enichlmair, H., Park, J.-M., Ceric, H., & Grasser, T. (2015). Predictive and efficient modeling of hot-carrier degradation in nLDMOS devices. In 2015 IEEE 27th International Symposium on Power Semiconductor Devices & IC’s (ISPSD). IEEE International Symposium on Power Semiconductor Devices and ICs (ISPSD), Hong Kong. https://doi.org/10.1109/ispsd.2015.7123471 ( reposiTUm)
Rovitto, M., Zisser, W., & Ceric, H. (2015). Analysis of Electromigration Void Nucleation Failure Time in Open Copper TSVs. In Proceedings of the IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA). IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA), Singapore. http://hdl.handle.net/20.500.12708/74611 ( reposiTUm)
Papaleo, S., Zisser, W., & Ceric, H. (2015). Effects of the Initial Stress at the Bottom of Open TSVs. In Proceedings of the IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA). IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA), Singapore. http://hdl.handle.net/20.500.12708/74612 ( reposiTUm)
Tyaginov, S., Bina, M., Franco, J., Wimmer, Y., Rudolf, F., Enichlmair, H., Park, J. M., Kaczer, B., Ceric, H., & Grasser, T. (2014). Dominant mechanisms of hot-carrier degradation in short- and long-channel transistors. In 2014 IEEE International Integrated Reliability Workshop Final Report (IIRW). IEEE International Reliability Workshop (IIRW), S. Lake Tahoe, Non-EU. https://doi.org/10.1109/iirw.2014.7049512 ( reposiTUm)
Zisser, W., Ceric, H., Weinbub, J., & Selberherr, S. (2014). Electromigration Reliability of Open TSV Structures. In Abstracts 25th European Symposium on Reliability of Electron Devices, Failure Physics and Analysis (ESREF) (p. 48). http://hdl.handle.net/20.500.12708/74178 ( reposiTUm)
Zisser, W. H., Ceric, H., Weinbub, J., & Selberherr, S. (2014). Electromigration induced resistance increase in open TSVs. In 2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD). 2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Yokohama, Japan. IEEE. https://doi.org/10.1109/sispad.2014.6931610 ( reposiTUm)
Ceric, H., Zisser, W. H., Rovitto, M., & Selberherr, S. (2014). Electromigration in solder bumps: A mean-time-to-failure TCAD study. In 2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD). 2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Yokohama, Japan. IEEE. https://doi.org/10.1109/sispad.2014.6931603 ( reposiTUm)
Wimmer, Y., Tyaginov, S., Rudolf, F., Rupp, K., Bina, M., Enichlmair, H., Park, J. M., Minixhofer, R., Ceric, H., & Grasser, T. (2014). Physical modeling of hot-carrier degradation in nLDMOS transistors. In 2014 IEEE International Integrated Reliability Workshop Final Report (IIRW). IEEE International Reliability Workshop (IIRW), S. Lake Tahoe, Non-EU. IEEE. https://doi.org/10.1109/iirw.2014.7049511 ( reposiTUm)
de Orio, R. L., Gousseau, S., Moreau, S., Cerice, H., Selberherr, S., Farcy, A., Bay, F., Inal, K., & Montmitonnet, P. (2014). On the material depletion rate due to electromigration in a copper TSV structure. In 2014 IEEE International Integrated Reliability Workshop Final Report (IIRW). IEEE International Reliability Workshop (IIRW), S. Lake Tahoe, Non-EU. https://doi.org/10.1109/iirw.2014.7049523 ( reposiTUm)
Ceric, H., Orio, R., Singulani, A. P., & Selberherr, S. (2014). 3D Technology Interconnect Reliability TCAD. In Proceedings of the 2014 Pan Pacific Microelectronics Symposium (pp. 1–8). http://hdl.handle.net/20.500.12708/74004 ( reposiTUm)
Zisser, W. H., Ceric, H., Weinbub, J., & Selberherr, S. (2014). Electromigration reliability of open TSV structures. In Proceedings of the 21th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA). IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA), Singapore, Non-EU. https://doi.org/10.1109/ipfa.2014.6898179 ( reposiTUm)
Ceric, H., & Selberherr, S. (2014). Electromigration reliability of solder bumps. In Proceedings of the 21th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA). IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA), Singapore, Non-EU. https://doi.org/10.1109/ipfa.2014.6898145 ( reposiTUm)
Ceric, H., & Selberherr, S. (2014). Electromigration induced failure of solder bumps and the role of IMC. In IEEE International Interconnect Technology Conference. IEEE International Interconnect Technology Conference (IITC), San Jose, USA, Non-EU. https://doi.org/10.1109/iitc.2014.6831891 ( reposiTUm)
Ceric, H., Zisser, W., & Selberherr, S. (2014). Quantum Mechanical Calculations of Electromigration Characteristics. In Abstracts of 13th International Workshop on Stress-Induced Phenomena in Microelectronics (p. 16). http://hdl.handle.net/20.500.12708/74265 ( reposiTUm)
Papaleo, S., Zisser, W., Singulani, A. P., Ceric, H., & Selberherr, S. (2014). Stress Evolution During the Nanoindentation in Open TSVs. In Abstracts of 13th International Workshop on Stress-Induced Phenomena in Microelectronics (p. 44). http://hdl.handle.net/20.500.12708/74264 ( reposiTUm)
Zisser, W., Ceric, H., & Selberherr, S. (2014). Void Evolution in Open TSVs. In Abstracts of 13th International Workshop on Stress-Induced Phenomena in Microelectronics (p. 58). http://hdl.handle.net/20.500.12708/74266 ( reposiTUm)
Papaleo, S., Zisser, W., Singulani, A. P., Ceric, H., & Selberherr, S. (2014). Stress Analysis in Open TSVs after Nanoindentation. In Abstracts (pp. 39–40). http://hdl.handle.net/20.500.12708/74186 ( reposiTUm)
Zisser, W., Ceric, H., & Selberherr, S. (2014). Stress Development and Void Evolution in Open TSVs. In Abstracts (pp. 38–39). http://hdl.handle.net/20.500.12708/74185 ( reposiTUm)
de Orio, R. L., Ceric, H., & Selberherr, S. (2013). Influence of temperature on the standard deviation of electromigration lifetimes. In 2013 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD). 2013 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Glasgow, United Kingdom of Great Britain and Northern Ireland (the). IEEE. https://doi.org/10.1109/sispad.2013.6650617 ( reposiTUm)
Coppeta, R. A., Ceric, H., Karunamurthy, B., & Grasser, T. (2013). Epitaxial Volmer-Weber growth modelling. In 2013 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD). 2013 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Glasgow, United Kingdom of Great Britain and Northern Ireland (the). IEEE. https://doi.org/10.1109/sispad.2013.6650570 ( reposiTUm)
Zisser, W. H., Ceric, H., de Orio, R. L., & Selberherr, S. (2013). Electromigration analyses of open TSVs. In 2013 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD). 2013 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Glasgow, United Kingdom of Great Britain and Northern Ireland (the). IEEE. https://doi.org/10.1109/sispad.2013.6650620 ( reposiTUm)
Singulani, A. P., Ceric, H., Filipovic, L., & Langer, E. (2013). Impact of bosch scallops dimensions on stress of an open through Silicon Via technology. In 2013 14th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE). International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, Poland, Non-EU. https://doi.org/10.1109/eurosime.2013.6529938 ( reposiTUm)
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Tyaginov, S. E., Starkov, I., Enichlmair, H., Jungemann, C., Park, J. M., Seebacher, E., Orio, R., Ceric, H., & Grasser, T. (2011). An Analytical Approach for Physical Modeling of Hot-Carrier Induced Degradation. In Proceedings of the 22nd European Symposium on the Reliability of Electron Devices, Failure Physics and Analysis (pp. 1525–1529). http://hdl.handle.net/20.500.12708/72336 ( reposiTUm)
Ceric, H., Orio, R., & Selberherr, S. (2011). Interconnect Reliability Dependence on Fast Diffusivity Paths. In Proceedings of the International Conference on Materials for Advanced Technologies (ICMAT 2011) (p. 33). http://hdl.handle.net/20.500.12708/72181 ( reposiTUm)
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Starkov, I., & Ceric, H. (2011). Impact of Interface State Density on MOSFET Local Oxide Capacitance Degradation During Hot-Carrier Stress. In Extended Abstracts of 2011 International Conference on Solid State Devices and Materials (pp. 90–91). http://hdl.handle.net/20.500.12708/72332 ( reposiTUm)
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Starkov, I., Tyaginov, S. E., Enichlmair, H., Park, J. M., Ceric, H., & Grasser, T. (2011). Accurate Extraction of MOSFET Interface State Spatial Distribution from Charge Pumping Measurements. In GADEST 2011: Abstract Booklet (pp. 105–106). http://hdl.handle.net/20.500.12708/72330 ( reposiTUm)
Tyaginov, S., Starkov, I., Triebl, O., Ceric, H., Grasser, T., Enichlmair, H., Park, J.-M., & Jungemann, C. (2011). Secondary generated holes as a crucial component for modeling of HC degradation in high-voltage n-MOSFET. In 2011 International Conference on Simulation of Semiconductor Processes and Devices. 2011 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Osaka, Japan. IEEE. https://doi.org/10.1109/sispad.2011.6035065 ( reposiTUm)
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Huang, R., Robl, W., Dehm, G., Ceric, H., & Detzel, T. (2010). Disparate Tendency of Stress Evolution of Thin and Thick Electroplated Cu Films at Room Temperature. In Proceedings of the 17#^{th} International Symposium on the Physical & Failure Analysis of Integrated Circuits (pp. 1–6). http://hdl.handle.net/20.500.12708/72887 ( reposiTUm)
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de Orio, R. L., Ceric, H., Cervenka, J., & Selberherr, S. (2009). The Effect of Copper Grain Size Statistics on the Electromigration Lifetime Distribution. In 2009 International Conference on Simulation of Semiconductor Processes and Devices. 2009 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), San Diego, CA, United States of America (the). IEEE. https://doi.org/10.1109/sispad.2009.5290219 ( reposiTUm)
Ceric, H., de Orio, R. L., Cervenka, J., & Selberherr, S. (2009). Copper Microstructure Impact on Evolution of Electromigration Induced Voids. In 2009 International Conference on Simulation of Semiconductor Processes and Devices. 2009 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), San Diego, CA, United States of America (the). IEEE. https://doi.org/10.1109/sispad.2009.5290222 ( reposiTUm)
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Lacerda de Orio, R., & Ceric, H. (2008). Analysis of electromigration in redundant vias. In 2008 International Conference on Simulation of Semiconductor Processes and Devices. 2008 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Kanagawa, Japan. IEEE. https://doi.org/10.1109/sispad.2008.4648281 ( reposiTUm)
Orio, R., Carniello, S., Ceric, H., & Selberherr, S. (2008). Analysis of Electromigration in Dual-Damascene Interconnect Structures. In ECS Transactions (pp. 337–348). http://hdl.handle.net/20.500.12708/70642 ( reposiTUm)
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Ceric, H., Orio, R., Cervenka, J., & Selberherr, S. (2008). TCAD Solutions for Submicron Copper Interconnect. In Proceedings 15#^{th} International Symposium on the Physical and Failure Analysis of Integrated Circuits (pp. 78–81). http://hdl.handle.net/20.500.12708/70253 ( reposiTUm)
Ceric, H., Lacerda de Orio, R., & Selberherr, S. (2008). Comprehensive modeling of electromigration induced interconnect degradation mechanisms. In 2008 26th International Conference on Microelectronics. International Conference on Microelectronics (MIEL), Beograd, Non-EU. https://doi.org/10.1109/icmel.2008.4559225 ( reposiTUm)
Hollauer, C., Ceric, H., van Barel, G., Witvrouw, A., & Selberherr, S. (2007). Investigation of Intrinsic Stress Effects in Cantilever Structures. In Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems (CD ROM) (p. 4). http://hdl.handle.net/20.500.12708/69558 ( reposiTUm)
Orio, R., Ceric, H., & Selberherr, S. (2007). Strain-Induced Anisotropy of Electromigration in Copper Interconnect. In 2007 International Semiconductor Device Research Symposium (p. 2). http://hdl.handle.net/20.500.12708/70045 ( reposiTUm)
Ceric, H., Nentchev, A., Langer, E., & Selberherr, S. (2007). Intrinsic Stress Build-Up During Volmer-Weber Crystal Growth. In T. Grasser & S. Selberherr (Eds.), Simulation of Semiconductor Processes and Devices 2007 (pp. 37–40). Springer-Verlag. https://doi.org/10.1007/978-3-211-72861-1_9 ( reposiTUm)
Ceric, H., & Selberherr, S. (2007). Electromigration in Interconnect Structures of Microelectronic Circuits. In Microelectronics, Electronics, and Electronic Technologies (MEET) (pp. 23–28). http://hdl.handle.net/20.500.12708/69827 ( reposiTUm)
Ceric, H., & Selberherr, S. (2007). Electromigration Modeling for Interconnect Structures in Microelectronics. In ECS Transactions (pp. 295–304). http://hdl.handle.net/20.500.12708/69826 ( reposiTUm)
Cervenka, J., Ceric, H., Ertl, O., & Selberherr, S. (2007). Three-Dimensional Sacrificial Etching. In T. Grasser & S. Selberherr (Eds.), Simulation of Semiconductor Processes and Devices 2007 (pp. 433–436). Springer-Verlag. https://doi.org/10.1007/978-3-211-72861-1_105 ( reposiTUm)
Orio, R., Ceric, H., & Selberherr, S. (2007). Effect of Strains on Anisotropic Material Transport in Copper Interconnect Structures under Electromigration Stress. In Book of Abstracts of the International Workshop on Computational Electronics (IWCE) (pp. 62–63). http://hdl.handle.net/20.500.12708/69804 ( reposiTUm)
Cervenka, J., Ceric, H., & Selberherr, S. (2007). Three-Dimensional Simulation of Sacrificial Etching. In T. Becker, C. Cané, & N. S. Barker (Eds.), Smart Sensors, Actuators, and MEMS III (pp. 452–460). SPIE. https://doi.org/10.1117/12.721979 ( reposiTUm)
Ceric, H., Langer, E., & Selberherr, S. (2007). Modeling of Residual Stresses in Thin Metal Films. In 9#^{th} International Workshop on Stress-Induced Phenomena in Metallization (p. 18). http://hdl.handle.net/20.500.12708/70078 ( reposiTUm)
Ceric, H., Langer, E., & Selberherr, S. (2007). Three-Phase Model for the Volmer-Weber Crystal Growth. In Nanostructures and Carrier Interactions (p. 127). http://hdl.handle.net/20.500.12708/70077 ( reposiTUm)
Ceric, H., Hollauer, C., & Selberherr, S. (2006). Simulation of Texture Development Caused Stress Build-Up in Electroplated Copper Lines. In Proceedings 13#^{th} International Symposium on the Physical and Failure Analysis of Integrated Circuits (pp. 359–363). http://hdl.handle.net/20.500.12708/69128 ( reposiTUm)
Wittmann, R., Puchner, H., Ceric, H., & Selberherr, S. (2006). Impact of Random Bit Values on NBTI Lifetime of an SRAM Cell. In Proceedings 13#^{th} International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA) (pp. 41–44). http://hdl.handle.net/20.500.12708/69130 ( reposiTUm)
Holzer, S., Hollauer, C., Ceric, H., Karner, M., Grasser, T., Langer, E., & Selberherr, S. (2006). Three-Dimensional Transient Interconnect Analysis With Regard to Mechanical Stress. In Proceedings 13#^{th} International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA) (pp. 154–157). http://hdl.handle.net/20.500.12708/69129 ( reposiTUm)
Ceric, H., Hollauer, C., & Selberherr, S. (2006). Three-Dimensional Simulation of Intrinsic Stress Build-Up in Thin Films. In 2006 International Conference on Simulation of Semiconductor Processes and Devices. 2012 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Monterey, California, United States of America (the). IEEE. https://doi.org/10.1109/sispad.2006.282869 ( reposiTUm)
Hollauer, C., Ceric, H., & Selberherr, S. (2006). Modeling of Intrinsic Stress Effects in Deposited Thin Films. In Eurosensors 20#^{th} Anniversary Vol. 1 (pp. 324–325). http://hdl.handle.net/20.500.12708/69244 ( reposiTUm)
Ceric, H., Cervenka, J., Langer, E., & Selberherr, S. (2006). Moving Boundary Applications in Process and Interconnect TCAD. In Proceedings Mini-Workshop on Anisotropic Motion Laws (pp. 13–16). http://hdl.handle.net/20.500.12708/69233 ( reposiTUm)
Movahhedi, M., Nentchev, A., Ceric, H., Abdipour, A., & Selberherr, S. (2006). A Finite Element Time-Domain Algorithm Based on the Alternating-Direction Implicit Method. In European Microwave Week 2006 Book of Abstracts (pp. 1–4). http://hdl.handle.net/20.500.12708/69243 ( reposiTUm)
Holzer, S., Hollauer, C., Ceric, H., Wagner, S., Entner, R., Langer, E., Grasser, T., & Selberherr, S. (2005). Three-Dimensional Transient Electro-Thermal Interconnect Simulation for Stress and Electromigration Analysis. In NSTI Nanotech Technical Proceedings (pp. 620–623). http://hdl.handle.net/20.500.12708/68483 ( reposiTUm)
Wittmann, R., Puchner, H., Hinh, L., Ceric, H., Gehring, A., & Selberherr, S. (2005). Simulation of Dynamic NBTI Degradation for a 90 nm CMOS Technology. In NSTI Nanotech Technical Proceedings (pp. 29–32). http://hdl.handle.net/20.500.12708/68488 ( reposiTUm)
Wittmann, R., Puchner, H., Hinh, L., Ceric, H., Gehring, A., & Selberherr, S. (2005). Impact of NBTI-driven Parameter Degradation on Lifetime of a 90nm p-MOSFET. In Final Report of the IEEE International Integrated Reliability Workshop (IIRW) (pp. 99–102). http://hdl.handle.net/20.500.12708/68996 ( reposiTUm)
Hollauer, C., Ceric, H., & Selberherr, S. (2005). Three-Dimensional Simulation of Thermal Oxidation and the Influence of Stress. In 208#^{th} ECS Meeting (p. 1). http://hdl.handle.net/20.500.12708/68909 ( reposiTUm)
Ceric, H., Hollauer, C., & Selberherr, S. (2005). Microstructure and Stress Aspects of Electromigration Modeling. In 8#^{th} International Workshop on Stress-Induced Phenomena in Metallization (p. P 17). http://hdl.handle.net/20.500.12708/68911 ( reposiTUm)
Ceric, H., Deshpande, V., Hollauer, C., Holzer, S., Grasser, T., & Selberherr, S. (2005). Comprehensive Analysis of Vacancy Dynamics Due to Electromigration. In Proceedings of the 12#^{th} International Symposium on the Physical & Failure Analysis of Integrated Circuits (pp. 100–103). http://hdl.handle.net/20.500.12708/68912 ( reposiTUm)
Hollauer, C., Holzer, S., Ceric, H., Wagner, S., Grasser, T., & Selberherr, S. (2005). Investigation of Thermo-Mechanical Stress in Modern Interconnect Layouts. In Proceedings of The Sixth International Congress on Thermal Stresses (pp. 637–640). Schriftenreihe der Technischen Universität Wien. http://hdl.handle.net/20.500.12708/68513 ( reposiTUm)
Hollauer, Ch., Ceric, H., & Selberherr, S. (2005). Three-Dimensional Simulation of Stress Dependent Thermal Oxidation. In 2005 International Conference On Simulation of Semiconductor Processes and Devices. 2005 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Tokyo, Japan. IEEE. https://doi.org/10.1109/sispad.2005.201503 ( reposiTUm)
Wessner, W., Ceric, H., Cervenka, J., & Selberherr, S. (2005). Dynamic Mesh Adaptation for Three-Dimensional Electromigration Simulation. In 2005 International Conference On Simulation of Semiconductor Processes and Devices. 2005 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Tokyo, Japan. IEEE. https://doi.org/10.1109/sispad.2005.201494 ( reposiTUm)
Holzer, S., Hollauer, C., Ceric, H., Wagner, S., Langer, E., Grasser, T., & Selberherr, S. (2005). Transient Electro-Thermal Investigations of Interconnect Structures Exposed to Mechanical Stress. In J. Lopez, F. V. Fernandez, J. M. Lopez-Villegas, & J. M. de la Rosa (Eds.), VLSI Circuits and Systems II (pp. 380–387). SPIE. https://doi.org/10.1117/12.608414 ( reposiTUm)

Beiträge in Büchern

Ceric, H., Zahedmanesh, H., Lacerda de Orio, R., & Selberherr, S. (2021). Models and Techniques for Reliability Studies of Nano-Scaled Interconnects. In S. Y. Yurish (Ed.), Advances in Measurements and Instrumentation: Reviews (pp. 93–111). International Frequency Sensor Association (IFSA) Publishing. http://hdl.handle.net/20.500.12708/30561 ( reposiTUm)
Ceric, H., Heinzl, R., Hollauer, C., Grasser, T., & Selberherr, S. (2006). Microstructure and Stress Aspects of Electromigration Modeling. In Stress-Induced Phenomena in Metallization (pp. 262–268). American Institute of Physics. http://hdl.handle.net/20.500.12708/25011 ( reposiTUm)
Hollauer, C., Ceric, H., & Selberherr, S. (2005). Three-Dimensional Simulation of Thermal Oxidation and the Influence of Stress. In ECS Meeting Abstracts (pp. 734–734). ECS Transactions. https://doi.org/10.1149/ma2005-02/19/734 ( reposiTUm)

Präsentationen

Ceric, H., Zahedmanesh, H., & Croes, K. (2019). Analysis of Electromigration Failure of Nano-Interconnects through a Combination of Modeling and Experimental Methods. European Symposium on Reliability of Electron Devices, Failure Physics and Analysis  (ESREF), Maastricht, Netherlands (the). http://hdl.handle.net/20.500.12708/91221 ( reposiTUm)
Singulani, A. P., Ceric, H., & Selberherr, S. (2013). Stress Evolution in the Metal Layers of TSVs with Bosch Scallops. European Symposium on Reliability of Electron Devices, Failure Physics and Analysis  (ESREF), Maastricht, EU. http://hdl.handle.net/20.500.12708/90205 ( reposiTUm)
Orio, R., Ceric, H., & Selberherr, S. (2011). A Compact Model for Early Electromigration Failures of Copper Dual-Damascene Interconnects. 22nd European Symposium on the Reliability of Electron Devices, Failure Physics and Analysis, Bordeaux, France, EU. http://hdl.handle.net/20.500.12708/89571 ( reposiTUm)
Rupp, K., & Ceric, H. (2010). Analytical and Numerical Investigation of the Segregation Problem. 4#^{th} International Conference Computational Methods in Applied Mathematics: CMAM-4, Bedlewo, EU. http://hdl.handle.net/20.500.12708/89268 ( reposiTUm)
Cervenka, J., Ceric, H., & Selberherr, S. (2007). Three-Dimensional Simulation of Sacrificial Etching. SPIE Smart Sensors, Actuators, and MEMS, Masapalomas, Spain, EU. http://hdl.handle.net/20.500.12708/88615 ( reposiTUm)
Wessner, W., Ceric, H., Hollauer, C., Langer, E., & Selberherr, S. (2005). Electromigration Reliability TCAD Solutions. SEMICON Europa2005, München, Austria. http://hdl.handle.net/20.500.12708/88274 ( reposiTUm)
Holzer, S., Hollauer, C., Ceric, H., Wagner, S., Langer, E., Grasser, T., & Selberherr, S. (2005). Transient Electro-Thermal Investigations of Interconnect Structures Exposed to Mechanical Stress. SPIE VLSI Circuits and Systems, Sevilla, Spain, Austria. http://hdl.handle.net/20.500.12708/88317 ( reposiTUm)
Ceric, H., & Selberherr, S. (2002). Simulative Prediction of the Resistance Change due to Electromigration Induced Void Evolution. European Symposium on Reliability of Electron Devices, Failure Physics and Analysis  (ESREF), Maastricht, EU. http://hdl.handle.net/20.500.12708/87973 ( reposiTUm)

Berichte

Ceric, H., Hehenberger, P. P., Milovanovic, G., Sverdlov, V., Vasicek, M., & Selberherr, S. (2009). VISTA Status Report June 2009. http://hdl.handle.net/20.500.12708/35720 ( reposiTUm)
Ceric, H., Grasser, T., Orio, R., Pourfath, M., Vasicek, M., & Selberherr, S. (2008). VISTA Status Report July 2008. http://hdl.handle.net/20.500.12708/34954 ( reposiTUm)
Ceric, H., Dhar, S., Karlowatz, G., Li, L., Pourfath, M., & Selberherr, S. (2007). VISTA Status Report June 2007. http://hdl.handle.net/20.500.12708/31398 ( reposiTUm)
Ceric, H., Karner, M., Nentchev, A., Schwaha, P., Ungersböck, S. E., & Selberherr, S. (2005). VISTA Status Report December 2005. http://hdl.handle.net/20.500.12708/31424 ( reposiTUm)
Ceric, H., Holzer, S., Sheikholeslami, A., Ayalew, T., Wittmann, R., & Selberherr, S. (2004). VISTA Status Report June 2004. http://hdl.handle.net/20.500.12708/31425 ( reposiTUm)
Ceric, H., Dragosits, K., Gehring, A., Smirnov, S., Palankovski, V., & Selberherr, S. (2002). VISTA Status Report December 2002. http://hdl.handle.net/20.500.12708/31430 ( reposiTUm)

Hochschulschriften

Ceric, H. (2014). Reliability of interconnect structures for modern integrated circuits [Professorial Dissertation, Technische Universität Wien]. reposiTUm. http://hdl.handle.net/20.500.12708/158745 ( reposiTUm)
Ceric, H. (2000). Analytical modeling of WDM LAN medium access protocols by means of semi-markov processes [Diploma Thesis, Technische Universität Wien]. reposiTUm. http://hdl.handle.net/20.500.12708/178185 ( reposiTUm)