Bobinac, J., Reiter, T., Piso, J., Klemenschits, X., Baumgartner, O., Stanojevic, Z., Strof, G., Karner, M., & Filipovic, L. (2023). Effect of Mask Geometry Variation on Plasma Etching Profiles.
Micromachines,
14(3), Article 665.
https://doi.org/10.3390/mi14030665 ( reposiTUm)