Proceedings Workshop on the Measurement and Characterization of Ultra-Shallow Doping Profiles in Semiconductors

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Proceedings Workshop on the Measurement and Characterization of Ultra-Shallow Doping Profiles in Semiconductors
 

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PreviewAuthor(s)TitleTypeIssue Date
1Khalil, N. ; Faricelli, John ; Huang, C.-L. ; Selberherr, Siegfried Two-Dimensional Dopant Profiling of Submicron MOSFETs Using Nonlinear Least Squares Inverse ModelingKonferenzbeitrag Inproceedings1995