Proceedings of SPIE Optical Microlithography
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Proceedings of SPIE Optical Microlithography
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Preview | Authors / Editors | Title | Type | Issue Date | |
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1 | Kirchauer, Heinrich ; Selberherr, Siegfried | A Three-Dimensional Photolithography Simulator Including Rigorous Nonplanar Exposure Simulation for Off-Axis Illumination | Konferenzbeitrag Inproceedings | 1998 |