Abstracts of the International Conference on Atomic Layer Deposition (ALD) Featuring the International Workshop on Atomic Layer Etching (ALE)
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Abstracts of the International Conference on Atomic Layer Deposition (ALD) Featuring the International Workshop on Atomic Layer Etching (ALE)
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| Preview | Authors / Editors | Title | Type | Issue Date | |
|---|---|---|---|---|---|
| 1 | Aguinsky, Luiz Felipe ; Manstetten, Paul ; Hössinger, Andreas ; Selberherr, Siegfried ; Weinbub, Josef | An Extended Knudsen Diffusion Model for Aspect Ratio Dependent Atomic Layer Etching | Konferenzbeitrag Inproceedings  | 2019 |