SPIE Optical Microlithography
Event name
SPIE Optical Microlithography
Start date
22-02-1998
End date
27-02-1998
Location
Santa Clara, CA, USA
Country
Event format Veranstaltungsformat
On Site
Results 1-1 of 1 (Search time: 0.001 seconds).
| Preview | Authors / Editors | Title | Type | Issue Date | |
|---|---|---|---|---|---|
| 1 | Kirchauer, Heinrich ; Selberherr, Siegfried | A Three-Dimensional Photolithography Simulator Including Rigorous Nonplanar Exposure Simulation for Off-Axis Illumination | Konferenzbeitrag Inproceedings | 1998 |