Title Titel
Thin Solid Films
 
e-ISSN
1879-2731
 
ISSN
0040-6090
 
Publisher Herausgeber
ELSEVIER SCIENCE SA
 
Publisher's Address Herausgeber Adresse
PO BOX 564, LAUSANNE, SWITZERLAND, 1001
 
Listed in SCI Aufgelistet im SCI
 
Peer reviewed Begutachtet
 
 

Publications Publikationen

Results 1-12 of 12 (Search time: 0.004 seconds).

PreviewAuthors / EditorsTitleTypeIssue Date
1Giuliani, Finn ; Ciurea, Constantin ; Bhakhri, Vineet ; Werchota, Malcolm ; Vandeperre, Luc J. ; Mayrhofer, Paul H. Deformation behaviour of TiN and Ti-Al-N coatings at 295 to 573KArtikel Article2019
2Gu, Xunlong ; Zhang, Zaoli ; Bartosik, Matthias ; Mayrhofer, Paul H. ; Duan, Huiping Dislocation densities and alternating strain fields in CrN/AlN nanolayersArtikel Article2017
3Hollerweger, R. ; Riedl, H. ; Arndt, M. ; Kolozsvari, S. ; Primig, S. ; Mayrhofer, P.H. Guidelines for increasing the oxidation resistance of Ti-Al-N based coatingsArtikel Article2019
4Asanuma, H. ; Klimashin, F.F. ; Polcik, P. ; Kolozsvári, S. ; Riedl, H. ; Mayrhofer, P.H. Impact of lanthanum and boron on the growth, thermomechanical properties and oxidation resistance of Ti-Al-N thin filmsArtikel Article2019
5Wistrela, E. ; Schmied, I. ; Schneider, M. ; Gillinger, M. ; Mayrhofer, P.M. ; Bittner, A. ; Schmid, U. Impact of sputter deposition parameters on the microstructural and piezoelectric properties of Cr x Al 1−x N thin filmsArtikel Article2018
6Grosser, Michaela ; Seidel, Helmut ; Schmid, Ulrich Microstructure and Mechanical Properties of Sputter Deposited Tantalum Nitride Thin Films after High Temperature LoadingArtikel Article2017
7Stüber, M. ; Riedl, H. ; Wojcik, T. ; Ulrich, S. ; Leiste, H. ; Mayrhofer, P.H. Microstructure of Al-containing magnetron sputtered TiB2 thin filmsArtikel Article2019
8Triendl, F. ; Pfusterschmied, G. ; Fleckl, G. ; Schwarz, S. ; Schmid, U. On the crystallization behavior of sputter-deposited a-Si films on 4H-SiCArtikel Article2020
9Dalbauer, V. ; Ramm, J. ; Kolozsvári, S. ; Koller, C.M. ; Mayrhofer, P.H. On the phase evolution of arc evaporated Al-Cr-based intermetallics and oxidesArtikel Article2017
10Gablech, Imrich ; Svatoš, Vojtěch ; Caha, Ondřej ; Dubroka, Adam ; Pekárek, Jan ; Klempa, Jaroslav ; Neužil, Pavel ; Schneider, Michael ; Šikola, Tomáš Preparation of high-quality stress-free (001) aluminum nitride thin film using a dual Kaufman ion-beam source setupArtikel Article2019
11Raab, R. ; Koller, C.M. ; Riedl, H. ; Kolozsvári, S. ; Ramm, J. ; Mayrhofer, P.H. The influence of synthetic air flow on the properties of arc evaporated Al-Cr-O-N coatingsArtikel Article2019
12Triendl, Fabian ; Pfusterschmied, Georg ; Berger, Claudio ; Schwarz, Sabine ; Artner, Werner ; Schmid, Ulrich Ti/4H-SiC schottky barrier modulation by ultrathin a-SiC:H interface layerArtikel Article2021