Name Card

Full name Familienname, Vorname
Hochleitner, Gottfried
 
Main Affiliation Organisations­zuordnung
 

Own Publications Eigene Publikationen

Results 1-20 of 37 (Search time: 0.001 seconds).

PreviewAuthor(s)TitleTypeIssue Date
1Wanzenböck, Heinz D. ; Shawrav, Mostafa Moonir ; Gavagnin, Marco ; Belic, Domagoj ; Rödinger, Peter ; Hochleitner, Gottfried ; Mika, Johann ; Taus, Philip ; Stöger-Pollach, Michael ; Bertagnolli, Emmerich Focused electron beam induced processing (FEBIP) as maskless 3D direct-write nanolithography platformKonferenzbeitrag Inproceedings2015
2Wanzenböck, Heinz D. ; Shawrav, Mostafa Moonir ; Hochleitner, Gottfried ; Bertagnolli, Emmerich Nozzle-based injection systems for FEBID characteristics and limiationsPräsentation Presentation2015
3Wanzenboeck, H. D. ; Hochleitner, G. ; Mika, J. ; Shawrav, M. M. ; Gavagnin, M. ; Bertagnolli, E. Mapping of local argon impingement on a virtual surface: an insight for gas injection during FEBIDArtikel Article 2014
4Wanzenböck, Heinz D. ; Hochleitner, Gottfried ; Mika, Johann ; Shawrav, Mostafa Moonir ; Bertagnolli, Emmerich Insights in precursor flux distribution on the sample surface - Is the nozzle setup reallyKonferenzbeitrag Inproceedings2014
5Hochleitner, Gottfried Investigation of electron-beam-induced chemical vapor deposition of iron and gold nanostructures in the low pressure chamber of a differentially pumped scanning electron microscopeThesis Hochschulschrift2011
6Wanzenböck, Heinz D. ; Rödiger, Peter ; Waid, Simon ; Hochleitner, Gottfried ; Bertagnolli, Emmerich Focused Beam Induced Etching - Making the Right Choice Between Ions and ElectronsPräsentation Presentation2011
7Rödiger, Peter ; Wanzenböck, Heinz D. ; Hochleitner, Gottfried ; Bertagnolli, Emmerich Etching of Germanium by Chlorine Gas using a Focused Electron BeamPräsentation Presentation2011
8Rödiger, Peter ; Wanzenböck, Heinz D. ; Hochleitner, Gottfried ; Waid, Simon ; Bertagnolli, Emmerich Removal of FIB-Induced Amorphization and Gallium Contamination by Focused-Electron-Beam-Induced-EtchingPräsentation Presentation2011
9Rödiger, Peter ; Wanzenböck, Heinz D. ; Hochleitner, Gottfried ; Lugstein, Alois ; Bertagnolli, Emmerich Local, Direct-Write, Damage-Free Thinning of Germanium NanowiresPräsentation Presentation2011
10Roediger, P ; Wanzenboeck, H D ; Waid, S ; Hochleitner, G ; Bertagnolli, E Focused-ion-beam-inflicted surface amorphization and gallium implantation-new insights and removal by focused-electron-beam-induced etchingArtikel Article 2011
11Roediger, Peter ; Wanzenboeck, Heinz D. ; Hochleitner, Gottfried ; Bertagnolli, Emmerich Crystallinity-retaining removal of germanium by direct-write focused electron beam induced etchingArtikel Article 2011
12Hochleitner, Gottfried ; Hörtlackner, Michael ; Rödiger, Peter ; Wanzenböck, Heinz D. ; Bertagnolli, Emmerich Experimental evaluation of gas-flux distribution with gas injection systems for focused beam induced depositionKonferenzbeitrag Inproceedings2010
13Hochleitner, Gottfried ; Hörtlackner, Michael ; Rödiger, Peter ; Wanzenböck, Heinz D. ; Bertagnolli, Emmerich Thermally assisted focused electron beam induced depositionKonferenzbeitrag Inproceedings2010
14Hochleitner, Gottfried ; Lugstein, Alois ; Rödiger, Peter ; Wanzenböck, Heinz D. ; Bertagnolli, Emmerich Nanowire Synthesis on catalyst arrays produced with electron beam induced depositionKonferenzbeitrag Inproceedings2010
15Rödiger, Peter ; Wanzenböck, Heinz D. ; Hochleitner, Gottfried ; Bertagnolli, Emmerich New Approach for Cleaning a SEM Chamber from Hydrocarbon ContaminationPräsentation Presentation2010
16Rödiger, Peter ; Wanzenböck, Heinz D. ; Hochleitner, Gottfried ; Bertagnolli, Emmerich Electron beam induced etching of silicon using chlorine gasPräsentation Presentation2010
17Rödiger, Peter ; Wanzenböck, Heinz D. ; Hochleitner, Gottfried ; Bertagnolli, Emmerich Etching of Silicon by Chlorine Gas using a Focused Electron BeamPräsentation Presentation2010
18Roediger, P. ; Wanzenboeck, H. D. ; Hochleitner, G. ; Bertagnolli, E. ; Buehler, W. Focused electron beam induced etching of silicon by chlorine gas: Negative effects of residual gas contamination on the etching processArtikel Article 2010
19Wanzenboeck, H. D. ; Roediger, P. ; Hochleitner, G. ; Bertagnolli, E. ; Buehler, W. Novel method for cleaning a vacuum chamber from hydrocarbon contaminationArtikel Article 2010
20Burchhart, T. ; Lugstein, A. ; Zeiner, C. ; Hyun, Y. J. ; Hochleitner, G. ; Bertagnolli, E. Nanowire-metal heterostructures for high performance MOSFETsArtikel Article 2010