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Full name Familienname, Vorname
Pahlke, S.
 

Own Publications Eigene Publikationen


Results 1-20 of 22 (Search time: 0.003 seconds).

PreviewAuthor(s)TitleTypeIssue Date
1Prost, Josef ; Felling, C. ; Wobrauschek, Peter ; Markowicz, A. ; Pahlke, S. ; Streli, Christina Application of a low power TXRF spectrometer for aerosol analysisPräsentation Presentation2012
2Prost, Josef ; Felling, C. ; Wobrauschek, Peter ; Markowicz, A. ; Pahlke, S. ; Streli, Christina Technical improvements of a low power TXRF spectrometer and its application for aerosol analysisPräsentation Presentation2012
3Prost, Josef ; Felling, C. ; Wobrauschek, Peter ; Markowicz, A. ; Pahlke, S. ; Streli, Christina TXRF for aerosol analysisPräsentation Presentation2012
4Meirer, F. ; Pepponi, Giancarlo ; Ingerle, D. ; Pahlke, S. ; Streli, Christina Retrofitting of an ATOMIKA 8010 TXRF Wafer-analyzer for GI-XRF AnalysisPräsentation Presentation2009
5Pahlke, S. ; Kemmer, J. ; Boslau, O. ; Pahlke, A. ; Stötter, R. ; Mantler, C. ; Wobrauschek, Peter ; Streli, Christina ; Meirer, F. Large Area VITUS Silicon Drift Detector in TXRF ApplicationPräsentation Presentation2007
6Pahlke, S. ; Meirer, F. ; Wobrauschek, Peter ; Streli, Christina ; Westphal, G. P. ; Mantler, Michael Adaptation of a commercial total reflection X-ray fluorescence system for wafer surface analysis equipped with a new generation of silicon drift detectorArtikel Article2006
7Streli, Christina ; Wobrauschek, Peter ; Fabry, L. ; Pahlke, S. ; Comin, F. ; Barrett, R. ; Pianetta, P. ; Lüning, K. ; Beckhoff, B. Total-Reflection X-Ray Fluorescence (TXRF) Wafer AnalysisBuchbeitrag Book Contribution2006
8Pahlke, S. ; Meirer, F. ; Streli, Christina ; Wobrauschek, Peter ; Westphal, G. P. ; Mantler, Michael Adaption of a commercial TXRF system for wafer surface analysis equipped with a new generation of silicon drift detectorPräsentation Presentation2005
9Wobrauschek, Peter ; Osmic, F. ; Streli, Christina ; Pahlke, S. ; Fabry, L. Si drift detector versus Si(Li) detector for TXRF applicationsPräsentation Presentation2002
10Streli, Christina ; Pepponi, Giancarlo ; Wobrauschek, Peter ; Zöger, N. ; Pianetta, P. ; Baur, K. ; Pahlke, S. ; Fabry, L. ; Mantler, C. ; Kanngießer, B. Synchrotron Radiation induced TXRF of low Z Elements on Si Wafer Surfaces at SSRL.Beamline 3-3Präsentation Presentation2002
11Streli, Christina ; Pepponi, Giancarlo ; Wobrauschek, Peter ; Beckhoff, B. ; Ulm, G. ; Pahlke, S. ; Fabry, L. ; Ehmann, T. ; Kanngießer, B. ; Malzer, W. Synchrotron Radiation induced TXRF of low Z Elements: Analysis of Si Wafer Surfaces at the PTB Undulator PGB Beamline at BESSYIIPräsentation Presentation2002
12Streli, Christina ; Pepponi, Giancarlo ; Wobrauschek, Peter ; Pianetta, P. ; Baur, K. ; Pahlke, S. ; Fabry, L. ; Mantler, C. ; Kanngießer, B. ; Malzer, W. Analysis of low Z Elements on Si Wafer Surfaces with Synchrotron Radiation induced TXRF at SSRL.Beamline 3-3: Comparison of Droplets with Spin coated WafersPräsentation Presentation2002
13Streli, Christina ; Pepponi, Giancarlo ; Wobrauschek, Peter ; Pianetta, P. ; Baur, K. ; Pahlke, S. ; Fabry, L. ; Mantler, C. ; Kanngießer, B. ; Malzer, W. Synchrotron Radiation induced TXRF of low Z Elements on Si Wafer Surfaces at SSRL.Beamline 3-3: Surface Contaminations and Depth ProfilesPräsentation Presentation2002
14Osmic, F. ; Wobrauschek, Peter ; Streli, Christina ; Pahlke, S. ; Fabry, L. A Si Drift Detector and a Si(Li) Detector in a TXRF Spectrometer for Wafer Analysis: A ComparisonPräsentation Presentation2002
15Ehmann, T. ; Pepponi, Giancarlo ; Beckhoff, B. ; Fabry, L. ; Streli, Christina ; Wobrauschek, Peter ; Ulm, G. ; Pahlke, S. Investigation of organic Contaminations on Si Wafers by TXRF-NEXAFSPräsentation Presentation2002
16Osmic, F. ; Wobrauschek, Peter ; Streli, Christina ; Pahlke, S. ; Fabry, L. Comparison of a Si drift detector with a Si(Li) detector in a TXRF spectrometer for wafer analysisPräsentation Presentation2002
17Streli, Christina ; Pepponi, Giancarlo ; Wobrauschek, Peter ; Beckhoff, B. ; Ulm, G. ; Pahlke, S. ; Fabry, L. ; Ehmann, T. ; Kanngießer, B. ; Malzer, W. Synchrotron radiation induced TXRF of low Z elements at the PTB undulator beamline at BESSY II: analysis of Si wafer surfacesPräsentation Presentation2002
18Pepponi, Giancarlo ; Beckhoff, B. ; Ehmann, T. ; Streli, Christina ; Wobrauschek, Peter ; Ulm, G. ; Pahlke, S. ; Fabry, L. Analysis of intentionally contaminated Si Wafers with TXRF-NEXAFSPräsentation Presentation2002
19Pepponi, Giancarlo ; Streli, Christina ; Beckhoff, B. ; Ulm, G. ; Ehmann, T. ; Pahlke, S. ; Fabry, L. NEXAFS Spectroscopy of Organic Contamination on Si Wafers by TXRFPräsentation Presentation2002
20Streli, Christina ; Pepponi, Giancarlo ; Wobrauschek, Peter ; Beckhoff, B. ; Ulm, G. ; Pahlke, S. ; Fabry, L. ; Ehmann, T. ; Kanngießer, B. ; Malzer, W. Analysis of low Z Elements on Si Wafer Surfaces with Synchrotron Radiation induced TXRF of low Z Elements at the PTB Undulator Beamline at BESSYPräsentation Presentation2002

Contributing Publications Mitbeteiligte Publikationen


Results 1-1 of 1 (Search time: 0.001 seconds).

PreviewEditor(s)TitleTypeIssue Date
1Streli, Christina ; Wobrauschek, Peter ; Fabry, L. ; Pahlke, S. ; Comin, F. ; Barrett, R. ; Pianetta, P. ; Lüning, K. ; Beckhoff, B. Total-Reflection X-Ray Fluorescence (TXRF) Wafer AnalysisBuch Book2006