Holsteyns, Frank

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Holsteyns, Frank
 

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PreviewAuthors / EditorsTitleTypeIssue Date
1Okorn-Schmidt, Harald F. ; Holsteyns, Frank ; Lippert, Alexander ; Mui, David ; Kawaguchi, Mark ; Lechner, Christiane ; Frommhold, Philipp E. ; Nowak, Till ; Reuter, Fabian ; Piqué, Miquel Banchs ; Cairós, Carlos ; Mettin, Robert Particle Cleaning Technologies to Meet Advanced Semiconductor Device Process RequirementsArtikel Article2014
2Okorn-Schmidt, Harald F. ; Holsteyns, Frank ; Lippert, Alexander ; Mui, David ; Kawaguchi, Mark ; Lechner, Christiane ; Frommhold, Philipp E. ; Nowak, Till ; Mettin, Robert (Invited) Particle Cleaning Technologies to Meet Advanced Semiconductor Device Process RequirementsKonferenzbeitrag Inproceedings2013
3Lechner, Christiane ; Kuhlmann, Hendrik ; Holsteyns, Frank ; Lippert, Alexander ; Junk, Markus Removal of nano-particles from wafer substrates by hydrodynamical forcesPräsentation Presentation2011
4Junk, Markus ; Holsteyns, Frank ; Staudegger, Felix ; Lechner, Christiane ; Kuhlmann, Hendrik ; Prieling, Doris ; Steiner, Helfried ; Gschaider, Bernhard Simulations Of Liquid Film Flows With Free Surface On Rotating Silicon Wafers (RoWaFlowSim)Konferenzbeitrag Inproceedings2011