Applied Surface Science

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Journal description

Title Titel
Applied Surface Science
 
e-ISSN
1873-5584
 
ISSN
0169-4332
 
Publisher Herausgeber
ELSEVIER
 
Publisher's Address Herausgeber Adresse
RADARWEG 29, AMSTERDAM, Netherlands, 1043 NX
 
Listed in SCI Aufgelistet im SCI
 
Peer reviewed Begutachtet
 
 

Publications Publikationen

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Author:  Schmid, U.
Subject:  ICP-CVD Silicon nitride Deposition rate Residual stress Wet etching Infrared spectroscopy X-ray photoelectron spectroscopy

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PreviewAuthor(s)TitleTypeIssue Date
1Dergez, D. ; Schalko, J. ; Bittner, A. ; Schmid, U. Fundamental properties of a-SiNx:H thin films deposited by ICP-PECVD for MEMS applicationsArtikel Article2013