Thin Solid Films

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Journal description

Title Titel
Thin Solid Films
 
e-ISSN
1879-2731
 
ISSN
0040-6090
 
Publisher Herausgeber
ELSEVIER SCIENCE SA
 
Publisher's Address Herausgeber Adresse
PO BOX 564, LAUSANNE, SWITZERLAND, 1001
 
Listed in SCI Aufgelistet im SCI
 
Peer reviewed Begutachtet
 
 

Publications Publikationen

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Subject:  Surfaces, Coatings and Films
Author:  Schneider, Michael

Results 1-6 of 6 (Search time: 0.003 seconds).

PreviewAuthor(s)TitleTypeIssue Date
1Frischmuth, Tobias ; Schneider, Michael ; Maurer, Daniel ; Grille, Thomas ; Schmid, Ulrich High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin filmsArtikel Article 2016
2Wistrela, E. ; Schmied, I. ; Schneider, M. ; Gillinger, M. ; Mayrhofer, P.M. ; Bittner, A. ; Schmid, U. Impact of sputter deposition parameters on the microstructural and piezoelectric properties of Cr x Al 1−x N thin filmsArtikel Article 2018
3Frischmuth, Tobias ; Schneider, Michael ; Bogdanović Radović, Iva ; Siketić, Zdravko ; Maurer, Daniel ; Grille, Thomas ; Schmid, Ulrich Lowtemperature deposition of a-SiC:H thin films applying a dual plasma source processArtikel Article 2016
4Dergez, D. ; Schneider, M. ; Bittner, A. ; Schmid, U. Mechanical and electrical properties of DC magnetron sputter deposited amorphous silicon nitride thin filmsArtikel Article2015
5Dergez, D. ; Schneider, M. ; Bittner, A. ; Pawlak, N. ; Schmid, U. Mechanical and electrical properties of RF magnetron sputter deposited amorphous silicon-rich silicon nitride thin filmsArtikel Article 2016
6Gablech, Imrich ; Svatoš, Vojtěch ; Caha, Ondřej ; Dubroka, Adam ; Pekárek, Jan ; Klempa, Jaroslav ; Neužil, Pavel ; Schneider, Michael ; Šikola, Tomáš Preparation of high-quality stress-free (001) aluminum nitride thin film using a dual Kaufman ion-beam source setupArtikel Article 2019