<div class="csl-bib-body">
<div class="csl-entry">Sistani, M., Böckle, R., Wind, L., Eysin, K., Maeder, X., Schweizer, P., Michler, J., Lugstein, A., & Weber, W. M. (2021). Polycrystalline Ge Nanosheets Embedded in Metal‐Semiconductor Heterostructures Enabling Wafer‐Scale 3D Integration of Ge Nanodevices with Self‐Aligned Al Contacts. <i>Advanced Electronic Materials</i>, <i>7</i>(5), 2100101. https://doi.org/10.1002/aelm.202100101</div>
</div>
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dc.identifier.issn
2199-160X
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/137122
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dc.language.iso
en
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dc.publisher
WILEY
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dc.relation.ispartof
Advanced Electronic Materials
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dc.subject
Electronic, Optical and Magnetic Materials
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dc.title
Polycrystalline Ge Nanosheets Embedded in Metal‐Semiconductor Heterostructures Enabling Wafer‐Scale 3D Integration of Ge Nanodevices with Self‐Aligned Al Contacts
en
dc.type
Artikel
de
dc.type
Article
en
dc.contributor.affiliation
Swiss Federal Laboratories for Materials Science and Technology, Switzerland
