<div class="csl-bib-body">
<div class="csl-entry">Schwestka, J., Inani, H., Tripathi, M., Niggas, A., McEvoy, N., Libisch, F., Aumayr, F., Kotakoski, J., & Wilhelm, R. A. (2020). Atomic-Scale Carving of Nanopores into a van der Waals Heterostructure with Slow Highly Charged Ions. <i>ACS Nano</i>, <i>14</i>(8), 10536–10543. https://doi.org/10.1021/acsnano.0c04476</div>
</div>
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dc.identifier.issn
1936-0851
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/140625
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dc.description.abstract
The growing family of 2D materials led not long
ago to combining different 2D layers and building artificial
systems in the form of van der Waals heterostructures.
Tailoring of heterostructure properties postgrowth would
greatly benefit from a modification technique with a monolayer
precision. However, appropriate techniques for material
modification with this precision are still missing. To achieve
such control, slow highly charged ions appear ideal as they carry
high amounts of potential energy, which is released rapidly
upon ion neutralization at the position of the ion. The resulting
potential energy deposition is thus limited to just a few atomic
layers (in contrast to the kinetic energy deposition). Here, we
irradiated a freestanding van der Waals MoS2/graphene
heterostructure with 1.3 keV/amu xenon ions in high charge states of 38, which led to nanometer-sized pores that appear only in the MoS2 facing the ion beam, but not in graphene beneath the hole. Reversing the stacking order leaves both layers undamaged, which we attribute to the high conductivity and carrier mobility in graphene acting as a shield for the MoS2 underneath. Our main focus is here on monolayer MoS2, but we also analyzed areas with few-layer structures and observed that the perforation is limited to the two topmost MoS2 layers, whereas deeper layers remain intact. Our results demonstrate that in addition to already being a valuable tool for materials processing, the usability of ion irradiation can be extended to mono- (or bi)layer manipulation of van der Waals heterostructures when the localized potential energy deposition of highly charged ions is also added to the toolbox.
en
dc.language.iso
en
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dc.publisher
AMER CHEMICAL SOC
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dc.relation.ispartof
ACS Nano
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dc.subject
General Engineering
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dc.subject
General Materials Science
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dc.subject
General Physics and Astronomy
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dc.subject
2D material modification
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dc.subject
ion beam surface modification
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dc.subject
monolayer precision
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dc.subject
van der Waals heterostructure
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dc.title
Atomic-Scale Carving of Nanopores into a van der Waals Heterostructure with Slow Highly Charged Ions
en
dc.type
Artikel
de
dc.type
Article
en
dc.description.startpage
10536
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dc.description.endpage
10543
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dc.type.category
Original Research Article
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tuw.container.volume
14
-
tuw.container.issue
8
-
tuw.journal.peerreviewed
true
-
tuw.peerreviewed
true
-
tuw.researchTopic.id
M2
-
tuw.researchTopic.name
Materials Characterization
-
tuw.researchTopic.value
100
-
dcterms.isPartOf.title
ACS Nano
-
tuw.publication.orgunit
E136 - Institut für Theoretische Physik
-
tuw.publication.orgunit
E134-03 - Forschungsbereich Atomic and Plasma Physics
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tuw.publisher.doi
10.1021/acsnano.0c04476
-
dc.identifier.eissn
1936-086X
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dc.description.numberOfPages
8
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tuw.author.orcid
0000-0002-7799-6606
-
tuw.author.orcid
0000-0001-6656-6347
-
tuw.author.orcid
0000-0002-5838-5789
-
tuw.author.orcid
0000-0001-5950-8755
-
tuw.author.orcid
0000-0001-5641-9458
-
tuw.author.orcid
0000-0002-9788-0934
-
tuw.author.orcid
0000-0002-1301-5266
-
tuw.author.orcid
0000-0001-9451-5440
-
wb.sci
true
-
wb.sciencebranch
Physik, Astronomie
-
wb.sciencebranch.oefos
1030
-
wb.facultyfocus
Physikalische Technologie
de
wb.facultyfocus
Physical Technology
en
wb.facultyfocus.faculty
E130
-
item.openairecristype
http://purl.org/coar/resource_type/c_2df8fbb1
-
item.grantfulltext
none
-
item.languageiso639-1
en
-
item.openairetype
research article
-
item.fulltext
no Fulltext
-
item.cerifentitytype
Publications
-
crisitem.author.dept
E134-03 - Forschungsbereich Atomic and Plasma Physics
-
crisitem.author.dept
E134-03 - Forschungsbereich Atomic and Plasma Physics
-
crisitem.author.dept
E136 - Institut für Theoretische Physik
-
crisitem.author.dept
E134-03 - Forschungsbereich Atomic and Plasma Physics
-
crisitem.author.dept
E134-03 - Forschungsbereich Atomic and Plasma Physics