<div class="csl-bib-body">
<div class="csl-entry">Fuchs, F., Bilal Khan, M., Deb, D., Pohl, D., Schuster, J., Weber, W. M., Mühle, U., Löffler, M., Georgiev, Y. M., Erbe, A., & Gemming, S. (2020). Formation and Crystallographic Orientation of NiSi₂-Si Interfaces. <i>Journal of Applied Physics</i>, <i>128</i>(8), 085301. https://doi.org/10.1063/1.5143122</div>
</div>
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dc.identifier.issn
0021-8979
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/141854
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dc.language.iso
en
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dc.publisher
AMER INST PHYSICS
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dc.relation.ispartof
Journal of Applied Physics
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dc.subject
General Physics and Astronomy
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dc.title
Formation and Crystallographic Orientation of NiSi₂-Si Interfaces