<div class="csl-bib-body">
<div class="csl-entry">Schuller, P., Rothbauer, M., Eilenberger, C., Kratz, S. R. A., Höll, G., Taus, P., Schinnerl, M., Genser, J., Ertl, P., & Wanzenboeck, H. (2019). Optimized plasma-assisted bi-layer photoresist fabrication protocol for high resolution microfabrication of thin-film metal electrodes on porous polymer membranes. <i>MethodsX</i>, <i>6</i>, 2606–2613. https://doi.org/10.1016/j.mex.2019.10.038</div>
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/143564
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dc.language.iso
en
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dc.publisher
Elsevier BV
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dc.relation.ispartof
MethodsX
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dc.subject
Medical Laboratory Technology
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dc.subject
Clinical Biochemistry
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dc.title
Optimized plasma-assisted bi-layer photoresist fabrication protocol for high resolution microfabrication of thin-film metal electrodes on porous polymer membranes