Birefringence profile adjustment by spatial overlap of nanogratings induced by ultra-short laser pulses inside fused silica

Abstract

We have succeeded in realizing a method to control the spatial distribution of optical retardation as a result of nanogratings in bulk-fused silica induced by ultrashort laser pulses. A colorimetry-based retardation measurement (CBRM) based on the Michel-Levy interference color chart using a polarization microscope is used to determine the profiles of the optical retardation. Effects of the spatial overlap of written regions as well as the energy and polarization of the writing pulses on the induced retardations are studied. It has been found that the spatial overlap of lines written by pulse trains with different energies and polarizations can result in an adjustment of the induced birefringence in the overlap region. This approach offers the possibility of designing polarization-sensitive components with a desired birefringence profile.