<div class="csl-bib-body">
<div class="csl-entry">Shawrav, M. M., Gökdeniz, Z. G., Wanzenboeck, H. D., Taus, P., Mika, J. K., Waid, S., & Bertagnolli, E. (2016). Chlorine based focused electron beam induced etching: A novel way to pattern germanium. <i>Materials Science in Semiconductor Processing</i>, <i>42</i>, 170–173. https://doi.org/10.1016/j.mssp.2015.08.033</div>
</div>
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dc.identifier.issn
1369-8001
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/148376
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dc.language.iso
en
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dc.publisher
ELSEVIER SCI LTD
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dc.relation.ispartof
Materials Science in Semiconductor Processing
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dc.subject
Mechanical Engineering
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dc.subject
Mechanics of Materials
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dc.subject
Condensed Matter Physics
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dc.subject
General Materials Science
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dc.title
Chlorine based focused electron beam induced etching: A novel way to pattern germanium