<div class="csl-bib-body">
<div class="csl-entry">Richter, S., Bahr, A. A. I., Wojcik, T., Ramm, J., Hunold, O., Polcik, P., Kolozsvári, S., & Riedl-Tragenreif, H. (2022, July 21). <i>Phase formation and oxidation resistance of physical vapor deposited MoSi2 thin films</i> [Poster Presentation]. Junior Euromat 2022, Coimbra, Portugal. http://hdl.handle.net/20.500.12708/152793</div>
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/152793
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dc.description.abstract
Molybdenum disilicide belongs to the group of refractory transition metal silicides, being a highly attractive class of coating material to withstand high-temperature oxidative environments. Due to the formation of a protective silicon-based oxide and having a mixed metallic and covalent bonding character, MoSi2 exhibits an interesting combination of outstanding high-temperature oxidation resistance but also suitable mechanical properties.
Within our study, we deposited MoSi2 thin films by direct current magnetron sputtering (DCMS) and by high power pulsed magnetron sputtering (HPPMS) in pure Ar atmospheres. For the growth of the films an in-house developed (lab-scaled) deposition system was used. The influence of the deposition parameters (e.g. deposition pressure, temperature, or bias potential) on the phase formation and mechanical properties was investigated systematically. All coatings deposited were in-depth analysed concerning their structure-mechanical properties, using a broad set of characterization techniques – i.e. scanning as well as transmission electron microscopy (SEM & TEM), X-ray diffraction (XRD), and nanoindentation. In addition, the oxidation kinetics were studied in detail using a combined differential scanning calorimetry/thermogravimetric system (DSC-TGA). The oxidation kinetics were analysed at different temperature regimes up to 1500 °C.
en
dc.description.sponsorship
CDG Christian Doppler Forschungsgesellschaft
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dc.language.iso
en
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dc.subject
Disilicides
en
dc.subject
PVD
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dc.subject
Protective Coatings
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dc.subject
Oxidation
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dc.subject
Phase Stability
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dc.title
Phase formation and oxidation resistance of physical vapor deposited MoSi2 thin films
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dc.type
Presentation
en
dc.type
Vortrag
de
dc.contributor.affiliation
Oerlikon (Liechtenstein), Liechtenstein
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dc.contributor.affiliation
Oerlikon (Liechtenstein), Liechtenstein
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dc.contributor.affiliation
Plansee (Germany), Germany
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dc.contributor.affiliation
Plansee (Germany), Germany
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dc.relation.grantno
CDL-SEC
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dc.type.category
Poster Presentation
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tuw.project.title
Oberflächentechnik von hochbeanspruchten Präzisionskomponenten
