<div class="csl-bib-body">
<div class="csl-entry">Okorn-Schmidt, H. F., Holsteyns, F., Lippert, A., Mui, D., Kawaguchi, M., Lechner, C., Frommhold, P. E., Nowak, T., Reuter, F., Piqué, M. B., Cairós, C., & Mettin, R. (2014). Particle Cleaning Technologies to Meet Advanced Semiconductor Device Process Requirements. <i>ECS Journal of Solid State Science and Technology</i>, <i>3</i>(1), N3069–N3080. https://doi.org/10.1149/2.011401jss</div>
</div>
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dc.identifier.issn
2162-8769
-
dc.identifier.uri
http://hdl.handle.net/20.500.12708/156362
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dc.language.iso
en
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dc.publisher
ELECTROCHEMICAL SOC INC
-
dc.relation.ispartof
ECS Journal of Solid State Science and Technology
-
dc.subject
Electronic, Optical and Magnetic Materials
-
dc.title
Particle Cleaning Technologies to Meet Advanced Semiconductor Device Process Requirements
en
dc.type
Artikel
de
dc.type
Article
en
dc.description.startpage
N3069
-
dc.description.endpage
N3080
-
dc.type.category
Original Research Article
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tuw.container.volume
3
-
tuw.container.issue
1
-
tuw.journal.peerreviewed
true
-
tuw.peerreviewed
true
-
tuw.researchTopic.id
X1
-
tuw.researchTopic.id
M1
-
tuw.researchTopic.id
C6
-
tuw.researchTopic.name
außerhalb der gesamtuniversitären Forschungsschwerpunkte