<div class="csl-bib-body">
<div class="csl-entry">Bethge, O., Abermann, S., Henkel, C., Straif, C. J., Hutter, H., & Bertagnolli, E. (2009). Impact of Germanium Surface Conditioning and ALD-growth Temperature on Al₂O₃/ZrO₂ High-k Dielectric Stacks. <i>Journal of The Electrochemical Society</i>, <i>156</i>(10), G168. https://doi.org/10.1149/1.3205455</div>
</div>
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dc.identifier.issn
0013-4651
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/166063
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dc.language.iso
en
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dc.publisher
ELECTROCHEMICAL SOC INC
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dc.relation.ispartof
Journal of The Electrochemical Society
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dc.subject
Condensed Matter Physics
-
dc.subject
Electronic, Optical and Magnetic Materials
-
dc.subject
Renewable Energy, Sustainability and the Environment
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dc.subject
Surfaces, Coatings and Films
-
dc.subject
Materials Chemistry
-
dc.subject
Electrochemistry
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dc.title
Impact of Germanium Surface Conditioning and ALD-growth Temperature on Al₂O₃/ZrO₂ High-k Dielectric Stacks
en
dc.type
Artikel
de
dc.type
Article
en
dc.description.startpage
G168
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dc.type.category
Original Research Article
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tuw.container.volume
156
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tuw.container.issue
10
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tuw.journal.peerreviewed
true
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tuw.peerreviewed
true
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M8
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M2
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M1
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Q4
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Structure-Property Relationship
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Special and Engineering Materials
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Materials Characterization
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Surfaces and Interfaces
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Nanoelectronics
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10
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30
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dcterms.isPartOf.title
Journal of The Electrochemical Society
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tuw.publication.orgunit
E164-01-2 - Forschungsgruppe Oberflächen-, Spurenanalytik und Chemometrie
