<div class="csl-bib-body">
<div class="csl-entry">Wessner, W., Cervenka, J., Heitzinger, C., Hossinger, A., & Selberherr, S. (2006). Anisotropic Mesh Refinement for the Simulation of Three-Dimensional Semiconductor Manufacturing Processes. <i>IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems</i>, <i>25</i>(10), 2129–2139. https://doi.org/10.1109/tcad.2005.862750</div>
</div>
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dc.identifier.issn
0278-0070
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/171737
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dc.publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
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dc.relation.ispartof
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
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dc.subject
Electrical and Electronic Engineering
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dc.subject
Software
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dc.subject
Computer Graphics and Computer-Aided Design
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dc.title
Anisotropic Mesh Refinement for the Simulation of Three-Dimensional Semiconductor Manufacturing Processes
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dc.type
Artikel
de
dc.type
Article
en
dc.description.startpage
2129
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dc.description.endpage
2139
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dc.type.category
Original Research Article
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tuw.container.volume
25
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tuw.container.issue
10
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true
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tuw.peerreviewed
true
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dcterms.isPartOf.title
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
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tuw.publication.orgunit
E360 - Institut für Mikroelektronik
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tuw.publisher.doi
10.1109/tcad.2005.862750
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dc.identifier.eissn
1937-4151
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dc.description.numberOfPages
11
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Elektrotechnik, Elektronik
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25
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research article
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restricted
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Publications
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E360 - Institut für Mikroelektronik
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E360-01 - Forschungsbereich Mikroelektronik
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E194-06 - Forschungsbereich Machine Learning
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E360 - Institut für Mikroelektronik
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E360 - Institut für Mikroelektronik
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E350 - Fakultät für Elektrotechnik und Informationstechnik
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E360 - Institut für Mikroelektronik
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E194 - Institut für Information Systems Engineering
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E350 - Fakultät für Elektrotechnik und Informationstechnik
