<div class="csl-bib-body">
<div class="csl-entry">Jüngling, W., Pichler, P., Selberherr, S., Guerrero, E., & Pötzl, H. (1985). Simulation of Critical IC Fabrication Processes Using Advanced Physical and Numerical Methods. <i>IEEE Transactions on Electron Devices</i>, <i>32</i>(2), 156–167. https://doi.org/10.1109/t-ed.1985.21925</div>
</div>
-
dc.identifier.issn
0018-9383
-
dc.identifier.uri
http://hdl.handle.net/20.500.12708/174374
-
dc.language.iso
en
-
dc.relation.ispartof
IEEE Transactions on Electron Devices
-
dc.subject
Electrical and Electronic Engineering
-
dc.subject
Electronic, Optical and Magnetic Materials
-
dc.title
Simulation of Critical IC Fabrication Processes Using Advanced Physical and Numerical Methods
en
dc.type
Artikel
de
dc.type
Article
en
dc.description.startpage
156
-
dc.description.endpage
167
-
dc.type.category
Original Research Article
-
tuw.container.volume
32
-
tuw.container.issue
2
-
tuw.journal.peerreviewed
true
-
tuw.peerreviewed
true
-
dcterms.isPartOf.title
IEEE Transactions on Electron Devices
-
tuw.publication.orgunit
E366 - Institut für Sensor- und Aktuatorsysteme
-
tuw.publication.orgunit
E360 - Institut für Mikroelektronik
-
tuw.publisher.doi
10.1109/t-ed.1985.21925
-
dc.identifier.eissn
1557-9646
-
dc.description.numberOfPages
12
-
wb.sci
true
-
wb.sciencebranch
Elektrotechnik, Elektronik
-
wb.sciencebranch.oefos
25
-
item.grantfulltext
restricted
-
item.openairecristype
http://purl.org/coar/resource_type/c_2df8fbb1
-
item.openairetype
research article
-
item.languageiso639-1
en
-
item.cerifentitytype
Publications
-
item.fulltext
no Fulltext
-
crisitem.author.dept
E360 - Institut für Mikroelektronik
-
crisitem.author.orcid
0000-0002-5583-6177
-
crisitem.author.parentorg
E350 - Fakultät für Elektrotechnik und Informationstechnik
