<div class="csl-bib-body">
<div class="csl-entry">Dreer, S. (2000). <i>Quantitative characterisation of silicon- and aluminium oxynitride films produced by reactive dc-magnetron sputtering</i> [Dissertation, Technische Universität Wien]. reposiTUm. http://hdl.handle.net/20.500.12708/183920</div>
</div>
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/183920
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dc.description
Zsfassung in dt. Sprache
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dc.format
Getr. Zählung
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dc.language
English
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dc.language.iso
en
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dc.subject
Dünne Schicht
de
dc.subject
Siliciumoxinitride
de
dc.subject
Aluminiumoxinitride
de
dc.subject
Magnetronsputtern
de
dc.subject
Quantitative Analyse
de
dc.title
Quantitative characterisation of silicon- and aluminium oxynitride films produced by reactive dc-magnetron sputtering
