<div class="csl-bib-body">
<div class="csl-entry">Thenikl, T. (2002). <i>Analysis of the interaction of process induced stress fields and dislocations in silicon devices</i> [Dissertation, Technische Universität Wien]. reposiTUm. http://hdl.handle.net/20.500.12708/186298</div>
</div>
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/186298
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dc.description
Zsfassung in dt. Sprache
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dc.language
English
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dc.language.iso
en
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dc.subject
Wafer
de
dc.subject
Silicium
de
dc.subject
Mechanische Spannung
de
dc.subject
Versetzung
de
dc.title
Analysis of the interaction of process induced stress fields and dislocations in silicon devices
