Lorentz near-field electron ptychography

Abstract

Over the past few years, electron ptychography has drawn considerable attention for its ability to recover high contrast and ultra-high resolution images without the need for high quality electron optics. In this Letter, we focus on electron ptychography's other potential benefits: quantitatively mapping phase variations resulting from magnetic and electric fields over extended fields of view. To this end, we propose an implementation of near-field ptychography that employs an amplitude mask located in the electron microscope's condenser aperture plane. We demonstrate the capabilities of our method by imaging a magnetic Permalloy sample and compare our results with those of off-axis electron holography.