<div class="csl-bib-body">
<div class="csl-entry">Bahr, A. A. I., Beck, O., Glechner, T., Grimmer, A., Wojcik, T., Kutrowatz, P., Ramm, J., Hunold, O., Kolozsvári, S., Polcik, P., Ntemou, E., Primetzhofer, D., & Riedl-Tragenreif, H. (2023). Quaternary diborides—improving the oxidation resistance of TiB2 ± z coatings by disilicide alloying. <i>Materials Research Letters</i>, <i>11</i>(9), 733–741. https://doi.org/10.1080/21663831.2023.2225554</div>
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dc.identifier.issn
2166-3831
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/192139
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dc.description.abstract
To overcome the limited oxidation resistance of the emerging class of transition metal borides, we suggest within this study novel quaternary diborides, Ti-TM-Si-B2 ± z (TM = Ta, Mo), achieving the compromise between excellent oxidation resistance and requirements of hard coatings. Single-phase AlB2-type structured Ti-TM-Si-B2 ± z films (3–5 µm) are sputter-deposited from TiB2/TMSi2 targets. The Ti-Ta-Si-B2 ± z coatings exhibit 36 GPa in hardness, while maintaining strongly retarded oxidation kinetics till 1000°C. Ti-Mo-Si-B2 ± z coatings preserve a hardness up to 27 GPa, although outperforming all their counterparts by featuring outstanding oxidation resistance with 440 nm oxide scale thickness after 1 h at 1200°C.
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dc.description.sponsorship
Christian Doppler Forschungsgesellschaft
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dc.language.iso
en
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dc.publisher
Taylor & Francis
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dc.relation.ispartof
Materials Research Letters
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dc.rights.uri
http://creativecommons.org/licenses/by/4.0/
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dc.subject
Disilicides
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dc.subject
oxidation resistance
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dc.subject
sputtering
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dc.subject
thin films
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dc.subject
Titanium diboride
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dc.subject
UHTC
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dc.title
Quaternary diborides—improving the oxidation resistance of TiB2 ± z coatings by disilicide alloying