<div class="csl-bib-body">
<div class="csl-entry">Taschner, R., Koch, T., Wolff, R., Stampfl, J., Liska, R., & Knaack, P. (2023). Evaluation of sulfonium borate initiators for cationic photopolymerization and their application in hot lithography. <i>ACS Applied Polymer Materials</i>, <i>5</i>(4), 3023–3033. https://doi.org/10.1021/acsapm.3c00191</div>
</div>
-
dc.identifier.issn
2637-6105
-
dc.identifier.uri
http://hdl.handle.net/20.500.12708/192859
-
dc.description.abstract
Sulfonium hexafluorophosphates and perfluorinated tetraphenylborates are well established initiators in the field of cationic photopolymerization and have already been applied in 3D-printing at elevated temperatures, named hot lithography. The cyanide-ligated borane-based photoinitiator B2 shows lower molecular weight compared to state-of-the-art borates and is less expensive to synthesize from commercial starting materials. By comparing reactivity in the epoxy monomer BADGE, B2 outperforms commercial initiators in a broad range of temperatures with outstanding epoxy group conversions of up to 99%. Besides B2’s excellent performance as a cationic initiator, formulations containing B2 are thermally and storage stable and can be sensitized by anthracene derivatives. Hot lithography of B2 was carried out successfully at 90 °C and compared to existing sulfonium initiators. Layer quality and coloration of the fabricated and postcured parts are superior for B2. Overall, the cyanide-ligated sulfonium salt B2 represents an excellent initiator for cationic photopolymerization and application in hot lithography.
en
dc.language.iso
en
-
dc.publisher
American Chemical Society (ACS)
-
dc.relation.ispartof
ACS Applied Polymer Materials
-
dc.rights.uri
http://creativecommons.org/licenses/by/4.0/
-
dc.subject
3D-printing
en
dc.subject
cationic photopolymerization
en
dc.subject
epoxy resin
en
dc.subject
hot lithography
en
dc.subject
sulfonium borate
en
dc.title
Evaluation of sulfonium borate initiators for cationic photopolymerization and their application in hot lithography