<div class="csl-bib-body">
<div class="csl-entry">Richter, S., Danner, D., Kutrowatz, P., Hahn, R., Ntemou, E., Primetzhofer, D., Wojcik, T., Jerg, C., Kolozsvári, S., Polcik, P., Ramm, J., & Riedl-Tragenreif, H. (2024, May 21). <i>Structural Evolution and Oxidation Resistance of Al/Si Alloyed Transition Metal Carbide Thin Films</i> [Conference Presentation]. 50th International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2024), San Diego, CA, United States of America (the). http://hdl.handle.net/20.500.12708/199510</div>
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/199510
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dc.description
Transition metal carbides (TMCs) are known for their mechanical properties‚ high-temperature stability and melting points exceeding 3000 °C. However‚ their exceptional high-temperature properties are offset by their sensitivity to oxidation. This study focuses on an alloying strategy incorporating Al and Si as strong oxide-forming elements to extend their oxidation resistance in demanding environments. Using a combinatorial physical vapor deposition (PVD) approach‚ group IV to VI transition metal carbides were systematically investigated by co-sputtering Al and Si next to TMCs. This comprehensive study covers a wide range of structural and chemical compositions‚ which are thoroughly characterized by X-ray diffraction (XRD)‚ nanoindentation‚ and elastic recoil detection analysis (ERDA) calibrated X-ray fluorescence (XRF) to achieve precise chemical quantification. Subsequently‚ a subset of selected compositions based on structural and mechanical criteria is analyzed concerning their oxidization resistance. In-situ XRD monitors the formation of oxide scales in synthetic air environments up to 1200 °C. In addition‚ conventional oxidation experiments in a box furnace contribute to a comprehensive understanding of the oxidation behavior of these TMCs. The formed scales are thoroughly described by transmission electron microscopy unraveling details on the diffusion kinetics of the oxide formers. This research not only explores the fundamental mechanisms that determine the scale formation of TMCs‚ but also provides valuable insights into the growth mechanism of ternary face-centered cubic (fcc) TM-Al/Si-C solid solutions synthesized by PVD techniques.
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dc.description.sponsorship
Christian Doppler Forschungsgesells
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dc.language.iso
en
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dc.subject
Oxidation Resistance
en
dc.subject
PVD thin films
en
dc.subject
Transition metal carbides
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dc.subject
Coatings
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dc.title
Structural Evolution and Oxidation Resistance of Al/Si Alloyed Transition Metal Carbide Thin Films
en
dc.type
Presentation
en
dc.type
Vortrag
de
dc.contributor.affiliation
Uppsala University, Sweden
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dc.contributor.affiliation
Uppsala University, Sweden
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dc.contributor.affiliation
Oerlikon (Liechtenstein), Liechtenstein
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dc.contributor.affiliation
Plansee (Germany), Germany
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dc.contributor.affiliation
Plansee (Germany), Germany
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dc.contributor.affiliation
Oerlikon (Liechtenstein), Liechtenstein
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dc.relation.grantno
CDL-SEC
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dc.type.category
Conference Presentation
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tuw.project.title
Oberflächentechnik von hochbeanspruchten Präzisionskomponenten
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tuw.researchinfrastructure
Röntgenzentrum
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tuw.researchinfrastructure
Universitäre Service-Einrichtung für Transmissionselektronenmikroskopie
