<div class="csl-bib-body">
<div class="csl-entry">Söll, A., Lopriore, E., Ottesen, A., Luxa, J., Pasquale, G., Sturala, J., Hájek, F., Jarý, V., Sedmidubsky, D., Mosina, K., Sokolovic, I., Rasouli, S., Grasser, T., Diebold, U., Kis, A., & Sofer, Z. (2024). High-κ wide-gap layered dielectric for two-dimensional van der Waals heterostructures. <i>ACS Nano</i>, <i>18</i>(15), 10397–10406. https://doi.org/10.1021/acsnano.3c10411</div>
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dc.identifier.issn
1936-0851
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/203760
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dc.description.abstract
van der Waals heterostructures of two-dimensional materials have unveiled frontiers in condensed matter physics, unlocking unexplored possibilities in electronic and photonic device applications. However, the investigation of wide-gap, high-κ layered dielectrics for devices based on van der Waals structures has been relatively limited. In this work, we demonstrate an easily reproducible synthesis method for the rare-earth oxyhalide LaOBr, and we exfoliate it as a 2D layered material with a measured static dielectric constant of 9 and a wide bandgap of 5.3 eV. Furthermore, our research demonstrates that LaOBr can be used as a high-κ dielectric in van der Waals field-effect transistors with high performance and low interface defect concentrations. Additionally, it proves to be an attractive choice for electrical gating in excitonic devices based on 2D materials. Our work demonstrates the versatile realization and functionality of 2D systems with wide-gap and high-κ van der Waals dielectric environments.
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dc.language.iso
en
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dc.publisher
AMER CHEMICAL SOC
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dc.relation.ispartof
ACS Nano
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dc.rights.uri
http://creativecommons.org/licenses/by/4.0/
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dc.subject
crystal synthesis
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dc.subject
dielectric
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dc.subject
excitons
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dc.subject
field-effect transistors
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dc.subject
heterostructures
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dc.subject
high-k
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dc.subject
two-dimensional materials
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dc.title
High-κ wide-gap layered dielectric for two-dimensional van der Waals heterostructures