<div class="csl-bib-body">
<div class="csl-entry">Hu, C., Lin, S., Podsednik, M., Mráz, S., Wojcik, T., Limbeck, A., Koutná, N., & Mayrhofer, P. H. (2024). Influence of co-sputtering AlB₂ to TaB₂ on stoichiometry of non-reactively sputtered boride thin films. <i>Materials Research Letters</i>, <i>12</i>(8), 561–570. https://doi.org/10.1080/21663831.2024.2357700</div>
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dc.identifier.issn
2166-3831
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/206743
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dc.description.abstract
Transition metal diboride thin films are promising functional materials for their outstanding mechanical properties and thermal stability. By combining experiment and simulations, we discuss angular distribution of the sputtered species, their scattering in the gas phase, re-sputtering and potential evaporation from the grown films for the complex evolution of film compositions, as well as energetic preference for vacancy formation and competing phases as factors for governing the phase constitution. By co-sputtering from two compound targets, we developed phase-pure crystalline (Ta,Al)B2 solid solution thin films and correlate the stoichiometry changes with the evolution of their microstructure, hardness, and elastic modulus.
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dc.language.iso
en
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dc.publisher
TAYLOR & FRANCIS INC
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dc.relation.ispartof
Materials Research Letters
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dc.subject
Ab initio
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dc.subject
diboride thin films
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dc.subject
hardness
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dc.subject
microstructure
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dc.subject
Stoichiometry
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dc.title
Influence of co-sputtering AlB₂ to TaB₂ on stoichiometry of non-reactively sputtered boride thin films