Salvadores Farran, Norma

Wojcik, T.

Jerg, Carmen

Gies,Astrid

Ramm, Jürgen

Kolozsvári, Szilard

Polcik, Peter

Huber, Tobias

Fleig, Juergen

Riedl, Helmut

2025-01-09T08:03:52Z

2025-01-09T08:03:52Z

2024-07-15

<div class="csl-bib-body"> <div class="csl-entry">Salvadores Farran, N., Wojcik, T., Jerg, C., Gies, A., Ramm, J., Kolozsvári, S., Polcik, P., Huber, T., Fleig, J., &#38; Riedl, H. (2024, July 15). <i>Electrical and morphological characterization of reactive PVD-deposited AlN and Al2O3 coatings</i> [Poster Presentation]. FEMS Junior EUROMAT 2024, Manchester, United Kingdom of Great Britain and Northern Ireland (the). http://hdl.handle.net/20.500.12708/208166</div> </div>

http://hdl.handle.net/20.500.12708/208166

Aluminium nitride (AlN) and aluminium oxide (Al2O3) are ceramic materials well known for their high electrical resistivity and excellent thermodynamic stability. Therefore, these materials have been used for various applications in low and high-temperature conditions, but especially for insulating purposes. Consequently, it is highly pertinent to explore how to grow thin films of AlN and Al2O3 with economically and sustainable deposition techniques. [1,2] Therefore, within this study, the deposition of AlN and Al2O3 thin films using different physical vapor deposition (PVD) methods has been explored in detail. All films were grown in an in-house developed magnetron sputter system using 3’’ Al targets. The coatings were deposited reactively, utilizing N2 and O2 for AlN and Al2O3, respectively. As the reactive growth of these insulating materials is challenging with respect to process stability, various techniques, including direct magnetron sputtering (DCMS), high-power pulsed magnetron sputtering (HPPMS), and pulsed magnetron sputtering (PMS), have been explored. A strong focus was the influence of the sputtering technique on the poisoning behaviour in relation to the respective N2 or O2 partial pressure. In addition, the impact of these various conditions on the structure, morphology, and electrical resistivity was investigated using high-resolution characterization methods. Phase formation was examined using X-ray diffractometry (XRD), while the deposition rate and film morphology were investigated through scanning and transmission electron microscopy (SEM and TEM). The insulating behaviour of the coatings was analysed using in-situ impedance spectroscopy across a temperature range from room temperature to 600°C. Ti/Pt electrode pads were deposited on the thin films using a lithography process for the impedance spectroscopy. For both thin materials AlN and Al2O3, a threshold reactive gas amount is required to shift the electric behaviour from a metallic to a purely dielectric mode, varying with the sputtering technique employed. In all cases, the enrichment of nitrogen or oxygen in the gas atmosphere is accompanied by a substantial decrease in the sputtering rate but stabilization of the single-phase pure structure, suggesting poisoned target conditions.

Christian Doppler Forschungsgesells

en

Insulating coatings

PVD

HIPIMS

Electrical and morphological characterization of reactive PVD-deposited AlN and Al2O3 coatings

Presentation

Vortrag

TU Wien, Austria

Oerlikon (Switzerland), Switzerland

Oerlikon (Liechtenstein), Liechtenstein

BU Coating - Plansee Composite Materials GmbH (Lechbruck am See, DE)

Plansee (Germany), Germany

CDL-SEC

Poster Presentation

Oberflächentechnik von hochbeanspruchten Präzisionskomponenten

M2

M1

Materials Characterization

Surfaces and Interfaces

50

50

E308-01-2 - Forschungsgruppe Angewandte Oberflächentechnik

0009-0007-6504-1849

0000-0001-5091-5215

0009-0009-1503-3546

0000-0001-7314-5938

0000-0002-3397-7681

0000-0003-3111-0029

0000-0001-6339-8341

0000-0002-8401-6717

0000-0002-8108-1185

FEMS Junior EUROMAT 2024

15-07-2024

18-07-2024

On Site

Event for scientific audience

Manchester

GB

Salvadores Farran, Norma

Maschinenbau

Werkstofftechnik

2030

2050

20

80

Publications

en

no Fulltext

conference poster not in proceedings

http://purl.org/coar/resource_type/c_18co

none

Christian Doppler Forschungsgesells

CDL-SEC

E308-01-2 - Forschungsgruppe Angewandte Oberflächentechnik

E308-03-1 - Forschungsgruppe Metallurgische Verarbeitungstechnologien

Oerlikon (Switzerland)

Oerlikon (Liechtenstein)

Oerlikon (Liechtenstein)

Plansee (Germany)

Plansee (Germany)

E164-04-3 - Forschungsgruppe Festkörperionik

E164-04 - Forschungsbereich Technische Elektrochemie

E308-01-2 - Forschungsgruppe Angewandte Oberflächentechnik

0000-0001-5091-5215

0009-0009-1503-3546

0000-0001-7314-5938

0000-0002-3397-7681

0000-0003-3111-0029

0000-0001-6339-8341

0000-0002-8401-6717

0000-0002-8108-1185

E308-01 - Forschungsbereich Werkstoffwissenschaft

E308-03 - Forschungsbereich Werkstofftechnik

E164-04 - Forschungsbereich Technische Elektrochemie

E164 - Institut für Chemische Technologien und Analytik

E308-01 - Forschungsbereich Werkstoffwissenschaft