<div class="csl-bib-body">
<div class="csl-entry">Jeon, D.-Y., Park, S. J., Pregl, S., Trommer, J., Heinzig, A., Mikolajick, T., & Weber, W. M. (2025). Channel Length Dependence of Effective Barrier Height Experienced by Charge Carriers in Schottky-Barrier Transistors Based on Si-Nanowire Arrays. <i>IEEE Journal of the Electron Devices Society</i>, <i>13</i>, 168–172. https://doi.org/10.1109/JEDS.2025.3547860</div>
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dc.identifier.issn
2168-6734
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/213978
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dc.description.abstract
Schottky-barrier (SB) transistors show great potential as advanced transistors for meeting power, performance, area, and cost requirements. In this study, the dominant transport mechanisms of SB Si-nanowire (NW) transistors were investigated with respect to channel length for accurate performance estimation and to provide key insights for practical applications. Evaluations of the temperature-dependent drain current, transconductance, and activation energy from SB Si-NW transistors revealed that the SB-dominant thermionic effect competes with Si-NW channel-limited conduction when the initial SB height is relatively low. Moreover, the Si-NW channel length was sufficiently long to dominate the total resistance, overcoming resistance effects arising from the SB.
en
dc.language.iso
en
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dc.publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
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dc.relation.ispartof
IEEE Journal of the Electron Devices Society
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dc.rights.uri
http://creativecommons.org/licenses/by/4.0/
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dc.subject
Charge Carriers
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dc.subject
Schottky-Barrier
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dc.subject
Transistors
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dc.subject
nanowire
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dc.title
Channel Length Dependence of Effective Barrier Height Experienced by Charge Carriers in Schottky-Barrier Transistors Based on Si-Nanowire Arrays
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dc.type
Article
en
dc.type
Artikel
de
dc.rights.license
Creative Commons Namensnennung 4.0 International
de
dc.rights.license
Creative Commons Attribution 4.0 International
en
dc.contributor.affiliation
Gyeongsang National University, Korea (the Republic of)
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dc.contributor.affiliation
Korean Intellectual Property Office, Korea (the Republic of)