<div class="csl-bib-body">
<div class="csl-entry">Scholz, F. (2025). <i>Influence of Si and Y S Z on the stabilization of amorphous Al2O3-based thin films at high temperatures</i> [Diploma Thesis, Technische Universität Wien]. reposiTUm. https://doi.org/10.34726/hss.2025.120458</div>
</div>
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dc.identifier.uri
https://doi.org/10.34726/hss.2025.120458
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/214625
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dc.language
English
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dc.language.iso
en
-
dc.rights.uri
http://rightsstatements.org/vocab/InC/1.0/
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dc.subject
HiPIMS
en
dc.subject
amorphous Al2O3
en
dc.title
Influence of Si and Y S Z on the stabilization of amorphous Al2O3-based thin films at high temperatures
en
dc.type
Thesis
en
dc.type
Hochschulschrift
de
dc.rights.license
In Copyright
en
dc.rights.license
Urheberrechtsschutz
de
dc.identifier.doi
10.34726/hss.2025.120458
-
dc.contributor.affiliation
TU Wien, Österreich
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dc.rights.holder
Florentine Scholz
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dc.publisher.place
Wien
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tuw.version
vor
-
tuw.thesisinformation
Technische Universität Wien
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dc.contributor.assistant
Salvadores Farran, Norma
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tuw.publication.orgunit
E308 - Institut für Werkstoffwissenschaft und Werkstofftechnologie
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dc.type.qualificationlevel
Diploma
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dc.identifier.libraryid
AC17500467
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dc.description.numberOfPages
69
-
dc.thesistype
Diplomarbeit
de
dc.thesistype
Diploma Thesis
en
dc.rights.identifier
In Copyright
en
dc.rights.identifier
Urheberrechtsschutz
de
tuw.advisor.staffStatus
staff
-
tuw.assistant.staffStatus
staff
-
tuw.advisor.orcid
0000-0002-8108-1185
-
item.openaccessfulltext
Open Access
-
item.openairecristype
http://purl.org/coar/resource_type/c_bdcc
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item.mimetype
application/pdf
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item.fulltext
with Fulltext
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item.cerifentitytype
Publications
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item.grantfulltext
embargo_20270430
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item.openairetype
master thesis
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item.languageiso639-1
en
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crisitem.author.dept
E057-05 - Fachbereich Analytical Instrumentation Center
