<div class="csl-bib-body">
<div class="csl-entry">Kautek, W., Krüger, J., Lenzner, M., Sartania, S., Spielmann, C., & Krausz, F. (1996). Laser ablation of dielectrics with pulse durations between 20 fs and 3 ps. <i>Applied Physics Letters</i>, <i>69</i>(21), 3146–3148. https://doi.org/10.1063/1.116810</div>
</div>
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dc.identifier.issn
0003-6951
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/219197
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dc.description.abstract
Laser-induced ablation has been extended down to a pulse duration of 20 fs generated by a Ti sapphire laser system at a wavelength of 780 nm. Barium aluminum borosilicate glass with an extremely high glass transformation temperature (∼600°C) served as target material. The most significant observation was a substantial decrease of the ablation threshold fluence at pulse durations below 100 fs. All results indicate a dominant role of multiphoton absorption in addition to collisional ionization in this time domain.
en
dc.language.iso
en
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dc.publisher
AIP PUBLISHING
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dc.relation.ispartof
Applied Physics Letters
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dc.subject
Ultrafast lasers
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dc.subject
Surface collisions
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dc.subject
Amorphous materials
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dc.title
Laser ablation of dielectrics with pulse durations between 20 fs and 3 ps
