<div class="csl-bib-body">
<div class="csl-entry">Scholz, F., Hemetsberger, J., Laudani, F., Rath, J., Sauer, M., Fahrnberger, F., Hahn, M., Hutter, H., Gies, A., Kolozsvári, S., Salvadores Farran, N., Foelske, A., & Riedl-Tragenreif, H. (2025, September 7). <i>Usage of advanced analytical techniques assessing the influence of Si on the stabilization of amorphous Al2O3-based thin films</i> [Poster Presentation]. SIMS Europe 2025, Gießen, Germany. http://hdl.handle.net/20.500.12708/221107</div>
</div>
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/221107
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dc.description.sponsorship
FFG - Österr. Forschungsförderungs- gesellschaft mbH
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dc.language.iso
en
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dc.subject
PVD coatings
en
dc.subject
Insulating coatings
en
dc.subject
TOF-SIMS
en
dc.title
Usage of advanced analytical techniques assessing the influence of Si on the stabilization of amorphous Al2O3-based thin films
en
dc.type
Presentation
en
dc.type
Vortrag
de
dc.contributor.affiliation
TU Wien
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dc.contributor.affiliation
Oerlikon (Liechtenstein)
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dc.relation.grantno
902876
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dc.type.category
Poster Presentation
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tuw.project.title
3 dimensionale Nanoanalytik von Hochleistungsmaterialien mittels Flugzeit aufgelöster Sekundärionen Massenspektrometrie
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tuw.researchinfrastructure
Analytical Instrumentation Center
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tuw.researchinfrastructure
Röntgenzentrum
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tuw.researchTopic.id
M2
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tuw.researchTopic.id
M1
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tuw.researchTopic.name
Materials Characterization
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tuw.researchTopic.name
Surfaces and Interfaces
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tuw.researchTopic.value
50
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tuw.researchTopic.value
50
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tuw.publication.orgunit
E057-05 - Fachbereich Analytical Instrumentation Center
