<div class="csl-bib-body">
<div class="csl-entry">Ghosh, R., Provias, A., Karl, A., Chaudhuri, R. R., Waldhör, D., Knobloch, T., Wilhelmer, C., & Grasser, T. (2025). Unveiling Fast Interface Trap Dynamics in Monolayer MoS₂ FETs. In <i>2025 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)</i> (pp. 1–4). IEEE. https://doi.org/10.1109/SISPAD66650.2025.11185969</div>
</div>
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/222643
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dc.description.abstract
wo-dimensional materials like molybdenum disulfide (MoS2) are viable candidates for future ultra-scaled stacked nanosheet field-effect transistors. For current transistor prototypes based on 2D materials, a hysteresis in the transfer characteristics is often observed. Threshold voltage hysteresis in 2D FETs is typically ascribed to insulator traps. While fast interface
traps are typically associated with changes in the subthreshold swing, here we show that they can also contribute to the hysteresis at low temperatures and fast operating frequencies. We employ the full quantum-mechanical non-radiative multi-phonon model to analyze trap-mediated charge transition in monolayer (1-L) MoS2 FETs at 300 K and 77 K. Simulating the trap responses over a wide range of parameters reveals that, depending on the
trap properties, the charge transition is either thermally activated or dominated by nuclear tunneling. We further demonstrate that the hysteresis of thermally activated traps can shift into the measurement window at low temperatures.
en
dc.description.sponsorship
European Commission
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dc.language.iso
en
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dc.subject
2D materials
en
dc.subject
MoS2 FETs
en
dc.subject
fast interface traps
en
dc.subject
reliability
en
dc.subject
hysteresis
en
dc.subject
physics-based models
en
dc.title
Unveiling Fast Interface Trap Dynamics in Monolayer MoS₂ FETs
en
dc.type
Inproceedings
en
dc.type
Konferenzbeitrag
de
dc.relation.isbn
979-8-3315-4883-4
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dc.description.startpage
1
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dc.description.endpage
4
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dc.relation.grantno
101021351
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dc.type.category
Full-Paper Contribution
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tuw.booktitle
2025 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
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tuw.peerreviewed
true
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tuw.relation.publisher
IEEE
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tuw.project.title
Fluoride für die nächste Generation von 2D Nanoelektronik
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tuw.researchTopic.id
C6
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tuw.researchTopic.name
Modeling and Simulation
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tuw.researchTopic.value
100
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tuw.publication.orgunit
E360-01 - Forschungsbereich Mikroelektronik
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tuw.publication.orgunit
E056-04 - Fachbereich TU-DX: Towards Applications of 2D Materials
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tuw.publication.orgunit
E138-06 - Forschungsbereich Komplexe Oxidsysteme
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tuw.publisher.doi
10.1109/SISPAD66650.2025.11185969
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dc.description.numberOfPages
4
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tuw.author.orcid
0000-0002-8631-5681
-
tuw.author.orcid
0000-0001-5156-9510
-
tuw.event.name
2025 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
en
tuw.event.startdate
24-09-2025
-
tuw.event.enddate
26-09-2025
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tuw.event.online
On Site
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tuw.event.type
Event for scientific audience
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tuw.event.place
Grenoble
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tuw.event.country
FR
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tuw.event.presenter
Ghosh, Rittik
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wb.sciencebranch
Elektrotechnik, Elektronik, Informationstechnik
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wb.sciencebranch.oefos
2020
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wb.sciencebranch.value
100
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item.openairetype
conference paper
-
item.openairecristype
http://purl.org/coar/resource_type/c_5794
-
item.cerifentitytype
Publications
-
item.languageiso639-1
en
-
item.grantfulltext
restricted
-
item.fulltext
no Fulltext
-
crisitem.author.dept
E360-01 - Forschungsbereich Mikroelektronik
-
crisitem.author.dept
E360-01 - Forschungsbereich Mikroelektronik
-
crisitem.author.dept
E360-01 - Forschungsbereich Mikroelektronik
-
crisitem.author.dept
E138-06 - Forschungsbereich Komplexe Oxidsysteme
-
crisitem.author.dept
E360-01 - Forschungsbereich Mikroelektronik
-
crisitem.author.dept
E360-01 - Forschungsbereich Mikroelektronik
-
crisitem.author.dept
E360-01 - Forschungsbereich Mikroelektronik
-
crisitem.author.dept
E360 - Institut für Mikroelektronik
-
crisitem.author.orcid
0000-0003-2221-8038
-
crisitem.author.orcid
0000-0002-8631-5681
-
crisitem.author.orcid
0000-0001-5156-9510
-
crisitem.author.parentorg
E360 - Institut für Mikroelektronik
-
crisitem.author.parentorg
E360 - Institut für Mikroelektronik
-
crisitem.author.parentorg
E360 - Institut für Mikroelektronik
-
crisitem.author.parentorg
E138 - Institut für Festkörperphysik
-
crisitem.author.parentorg
E360 - Institut für Mikroelektronik
-
crisitem.author.parentorg
E360 - Institut für Mikroelektronik
-
crisitem.author.parentorg
E360 - Institut für Mikroelektronik
-
crisitem.author.parentorg
E350 - Fakultät für Elektrotechnik und Informationstechnik