<div class="csl-bib-body">
<div class="csl-entry">Yuki, O., Stella, R., & Filipovic, L. (2025). Development of a Gaussian Approximation Potential for Gan With Point Defects and Mg Impurities. In <i>2025 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)</i> (pp. 1–4). IEEE. https://doi.org/10.1109/SISPAD66650.2025.11185965</div>
</div>
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/225999
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dc.description.abstract
We present a new Gaussian approximation potential (GAP) for the Ga-N-Mg system, developed to accurately describe GaN containing point defects and Mg impurities. By carefully sampling a diverse set of defect-containing and doped structures, the potential reproduces the formation energies and diffusion barriers of point defects in GaN as calculated by density functional theory. Specifically, the GAP reproduces formation energies within a maximum deviation of 1.9 eV and diffusion barrier energies within 0.4 eV. This potential enables large-scale molecular dynamics simulations of defect dynamics in GaN, including the effects of Mg doping.
en
dc.description.sponsorship
Christian Doppler Forschungsgesells
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dc.description.sponsorship
Fuji Electric CO., Ltd.
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dc.language.iso
en
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dc.subject
diffusion barrier energy
en
dc.subject
formation energy
en
dc.subject
GaN
en
dc.subject
Gaussian approximation potential (GAP)
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dc.subject
Mg doping
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dc.subject
point defect
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dc.title
Development of a Gaussian Approximation Potential for Gan With Point Defects and Mg Impurities
en
dc.type
Inproceedings
en
dc.type
Konferenzbeitrag
de
dc.contributor.affiliation
TU Wien, Austria
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dc.relation.isbn
979-8-3315-4883-4
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dc.description.startpage
1
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dc.description.endpage
4
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dc.relation.grantno
00000
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dc.relation.grantno
MDM-WiSe
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dc.type.category
Full-Paper Contribution
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tuw.booktitle
2025 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
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tuw.peerreviewed
true
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tuw.relation.publisher
IEEE
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tuw.project.title
Multi-Scale-Prozessmodellierung von Halbleiter-Bauelemente und -Sensoren
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tuw.project.title
Molekulardynamische Modellierung der Herstellung von Breitband-Halbleitern
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tuw.researchinfrastructure
Vienna Scientific Cluster
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tuw.researchTopic.id
Q4
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tuw.researchTopic.id
C6
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tuw.researchTopic.id
C1
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tuw.researchTopic.name
Nanoelectronics
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tuw.researchTopic.name
Modeling and Simulation
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tuw.researchTopic.name
Computational Materials Science
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tuw.researchTopic.value
20
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tuw.researchTopic.value
20
-
tuw.researchTopic.value
60
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tuw.publication.orgunit
E360-01 - Forschungsbereich Mikroelektronik
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tuw.publication.orgunit
E056-04 - Fachbereich TU-DX: Towards Applications of 2D Materials
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tuw.publisher.doi
10.1109/SISPAD66650.2025.11185965
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dc.description.numberOfPages
4
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tuw.author.orcid
0000-0003-1687-5058
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tuw.event.name
International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
en
tuw.event.startdate
24-09-2025
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tuw.event.enddate
26-09-2025
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tuw.event.online
On Site
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tuw.event.type
Event for scientific audience
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tuw.event.place
Grenoble
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tuw.event.country
FR
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tuw.event.presenter
Yuki, Ohuchi
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tuw.event.track
Multi Track
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wb.sciencebranch
Elektrotechnik, Elektronik, Informationstechnik
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wb.sciencebranch.oefos
2020
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wb.sciencebranch.value
100
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item.openairecristype
http://purl.org/coar/resource_type/c_5794
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item.fulltext
no Fulltext
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item.languageiso639-1
en
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item.grantfulltext
restricted
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item.openairetype
conference paper
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item.cerifentitytype
Publications
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crisitem.author.dept
E360 - Institut für Mikroelektronik
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crisitem.author.dept
TU Wien, Austria
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crisitem.author.dept
E360-01 - Forschungsbereich Mikroelektronik
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crisitem.author.orcid
0000-0003-1687-5058
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crisitem.author.parentorg
E350 - Fakultät für Elektrotechnik und Informationstechnik