<div class="csl-bib-body">
<div class="csl-entry">Boschetto, G., Wilhelmer, C., Cvitkovich, L., Li, J., Waldhör, D., Grasser, T., & Martinez, B. (2025). Multi-Scale Simulation Framework for the Modelling of Charge Capture and Emission in Spin Qubit Devices. In <i>2025 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)</i> (pp. 1–4). IEEE. https://doi.org/10.1109/SISPAD66650.2025.11186020</div>
</div>
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dc.identifier.uri
http://hdl.handle.net/20.500.12708/226015
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dc.description.abstract
Charge transfer events can degrade the performance of spin qubits by inducing instabilities and decoherence. We present a multi-scale simulation approach to model these transitions and quantify their impact on qubit properties. Applying this framework to hole transfer between hydrogen bridge defects in SiO<inf>2</inf> and nearby gates, we find that, while their slow dynamics and large electrostatic impact rule them out as the main source of charge-noise-driven decoherence, such events can account for observed device instabilities.
en
dc.description.sponsorship
European Commission
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dc.language.iso
en
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dc.subject
charge noise
en
dc.subject
Si Spin qubit
en
dc.subject
density functional theory
en
dc.subject
TCAD
en
dc.subject
nonradiative multi-phonon (NMP) theory
en
dc.title
Multi-Scale Simulation Framework for the Modelling of Charge Capture and Emission in Spin Qubit Devices
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dc.type
Inproceedings
en
dc.type
Konferenzbeitrag
de
dc.contributor.affiliation
Université Grenoble Alpes, France
-
dc.contributor.affiliation
University of Regensburg, Germany
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dc.contributor.affiliation
Université Grenoble Alpes, France
-
dc.contributor.affiliation
Université Grenoble Alpes, France
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dc.relation.isbn
979-8-3315-4883-4
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dc.relation.doi
10.1109/SISPAD66650.2025
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dc.description.startpage
1
-
dc.description.endpage
4
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dc.relation.grantno
101021351
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dc.type.category
Full-Paper Contribution
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tuw.booktitle
2025 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
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tuw.peerreviewed
true
-
tuw.relation.publisher
IEEE
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tuw.project.title
Fluoride für die nächste Generation von 2D Nanoelektronik
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tuw.researchTopic.id
Q4
-
tuw.researchTopic.id
C6
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tuw.researchTopic.name
Nanoelectronics
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tuw.researchTopic.name
Modeling and Simulation
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tuw.researchTopic.value
50
-
tuw.researchTopic.value
50
-
tuw.publication.orgunit
E360-01 - Forschungsbereich Mikroelektronik
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tuw.publication.orgunit
E056-04 - Fachbereich TU-DX: Towards Applications of 2D Materials
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tuw.publisher.doi
10.1109/SISPAD66650.2025.11186020
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dc.description.numberOfPages
4
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tuw.author.orcid
0000-0002-8631-5681
-
tuw.event.name
2025 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
en
tuw.event.startdate
24-09-2025
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tuw.event.enddate
26-09-2025
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tuw.event.online
On Site
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tuw.event.type
Event for scientific audience
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tuw.event.place
Grenoble
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tuw.event.country
FR
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tuw.event.presenter
Boschetto, G.
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wb.sciencebranch
Elektrotechnik, Elektronik, Informationstechnik
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wb.sciencebranch.oefos
2020
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wb.sciencebranch.value
100
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item.openairecristype
http://purl.org/coar/resource_type/c_5794
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item.fulltext
no Fulltext
-
item.languageiso639-1
en
-
item.grantfulltext
restricted
-
item.openairetype
conference paper
-
item.cerifentitytype
Publications
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crisitem.author.dept
Université Grenoble Alpes, France
-
crisitem.author.dept
E360-01 - Forschungsbereich Mikroelektronik
-
crisitem.author.dept
E360-01 - Forschungsbereich Mikroelektronik
-
crisitem.author.dept
Université Grenoble Alpes, France
-
crisitem.author.dept
E360-01 - Forschungsbereich Mikroelektronik
-
crisitem.author.dept
E360 - Institut für Mikroelektronik
-
crisitem.author.dept
Université Grenoble Alpes, France
-
crisitem.author.orcid
0000-0002-8631-5681
-
crisitem.author.parentorg
E360 - Institut für Mikroelektronik
-
crisitem.author.parentorg
E360 - Institut für Mikroelektronik
-
crisitem.author.parentorg
E360 - Institut für Mikroelektronik
-
crisitem.author.parentorg
E350 - Fakultät für Elektrotechnik und Informationstechnik