Bermanschläger, Sarah Christine

Salvadores Farran, Norma

Wojcik, Tomasz

Kolozsvári, Szilard

Bleicher, Friedrich

Mayrhofer, Paul Heinz

2026-06-29T04:08:12Z

2026-06-29T04:08:12Z

2026-06-11

<div class="csl-bib-body"> <div class="csl-entry">Bermanschläger, S. C., Salvadores Farran, N., Wojcik, T., Kolozsvári, S., Bleicher, F., &#38; Mayrhofer, P. H. (2026, June 11). <i>Low-defect Deposition of Electrically Insulating AlN/Al2O3 Multilayers with Bipolar Pulsed Magnetron Sputtering</i> [Conference Presentation]. 20th International Conference on Thin Films (ICTF 2026), Biarritz, France.</div> </div>

http://hdl.handle.net/20.500.12708/229025

The deposition of electrically insulating coatings is a challenging topic. This is especially true for applications where it is crucial that growth defects do not interfere with the function of the coating. Current deposition methods often have major disadvantages, including high deposition temperatures and low deposition rates, and cannot be easily integrated into existing industrial processes. This study investigated the potential for the deposition of low-defect coatings using bipolar pulsed magnetron sputtering with the aim of overcoming some of these limitations. Generally, sputtering low or non-conductive materials is demanding due to process instabilities or poor film quality. The latter can be primarily attributed to growth defects that inherently form during sputtering processes. Consequently, the film functionality can be improved by preventing the formation of growth defects. The present study pursued the approach of minimizing defect growth by interrupting layer growth. Initial concepts included non-reactive deposition of AlN to avoid problems due to target poisoning, the periodic application of a bias voltage during short deposition interruptions, plasma modulation, and the deposition of multilayer coatings by combining metallic seed layers with a sequence of different oxides to the desired insulating material. Progress was subsequently achieved by combining AlN and Al2O3 in a multilayer structure, as both materials appear to preferentially form different growth defects. The coating was deposited with a single metallic Al target and varying the reactive gas from nitrogen to oxygen. Another strategy applied was to ground the substrate holder during deposition, which resulted in more homogeneous coatings and proved to be crucial for the process. This approach has enabled reproducible deposition at rates of up to 500 nm/h at a substrate temperature of 400 °C. Further investigations revealed a resistivity of up to 7E11 Ω·cm and columnar growth of AlN as well as mixed crystalline and amorphous growth of Al2O3 with sharp layer interfaces.

FFG - Österr. Forschungsförderungs- gesellschaft mbH

en

Electrically Insulating Coatings

Magnetron Sputtering

Growth Defects

Low-defect Deposition of Electrically Insulating AlN/Al2O3 Multilayers with Bipolar Pulsed Magnetron Sputtering

Presentation

Vortrag

Plansee (Germany), Germany

899474

Conference Presentation

Integrated Data‐based Process Chain Optimisation in Casting and Machining Production 

Röntgenzentrum

Universitäre Service-Einrichtung für Transmissionselektronenmikroskopie

M2

M1

M4

Materials Characterization

Surfaces and Interfaces

Non-metallic Materials

50

10

40

E311-01-1 - Forschungsgruppe Fertigungstechnologie

E308-01-1 - Forschungsgruppe Werkstoffwissenschaft Dünner Schichten

E311-01-2 - Forschungsgruppe Werkzeugmaschinen

E311-01-4 - Forschungsgruppe Fertigungsmesstechnik und adaptronische Systeme

0009-0001-5750-8994

0000-0001-5091-5215

0000-0002-3397-7681

0000-0003-3429-867X

0000-0001-7328-9333

20th International Conference on Thin Films (ICTF 2026)

TU Wien Bibliothek

ReMade@Ari

41945

08-06-2026

12-06-2026

On Site

Event for scientific audience

Biarritz

FR

Bermanschläger, Sarah Christine

Maschinenbau

Werkstofftechnik

2030

2050

20

80

none

no Fulltext

Publications

en

conference paper not in proceedings

http://purl.org/coar/resource_type/c_18cp

E311-01-1 - Forschungsgruppe Fertigungstechnologie

E308-01-2 - Forschungsgruppe Angewandte Oberflächentechnik

E308-03-1 - Forschungsgruppe Metallurgische Verarbeitungstechnologien

Plansee (Germany), Germany

E311 - Institut für Fertigungstechnik und Photonische Technologien

E308-01 - Forschungsbereich Werkstoffwissenschaft

0009-0001-5750-8994

0000-0001-5091-5215

0000-0002-3397-7681

0000-0003-3429-867X

0000-0001-7328-9333

E311-01 - Forschungsbereich Fertigungstechnik

E308-01 - Forschungsbereich Werkstoffwissenschaft

E308-03 - Forschungsbereich Werkstofftechnik

E300 - Fakultät für Maschinenwesen und Betriebswissenschaften

E308 - Institut für Werkstoffwissenschaft und Werkstofftechnologie

FFG - Österr. Forschungsförderungs- gesellschaft mbH

899474