<div class="csl-bib-body">
<div class="csl-entry">Eder, A., Schmid, G. H. S., Mahr, H., & Eisenmenger-Sittner, C. (2016). Aspects of thin film deposition on granulates by physical vapor deposition. <i>The European Physical Journal D</i>. https://doi.org/10.1140/epjd/e2016-70435-7</div>
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Thin film and coating technology has entered fields which may show significant deviations from classical coating applications where films are deposited on plane, sometimes large substrates. Often surfaces of small and irregularly shaped bodies have to be improved in respect to electrical, thermal or mechanical properties. Film deposition and characterization on such small substrates is not a trivial task. This specially holds for methods based on Physical Vapor Deposition (PVD) processes such as sputter deposition and its ion- and plasma assisted varieties. Due to their line of sight nature a key issue for homogenous films is efficient intermixing. If this problem is mastered, another task is the prediction and determination of the film thickness on single particles as well as on large scale ensembles thereof. In this work a mechanism capable of uniformly coating up to 1000 cm3 of granulate with particle sizes ranging from approx. 10 μm to 150 μm by magnetron sputtering is thoroughly described. A method for predicting the average film thickness on the particles is presented and tested for several differently shaped objects like microspheres, irregular grains of sinter powder or micro diamonds. For assessing the film thickness on single particles as well as on particle ensembles several complementary methods based on optics, X-ray analysis and gravimetry are employed. Their respective merits and limitations are discussed. Finally an outlook on adapting the described technology for surface modification by plasma based reactive and non-reactive processes is given.
en
dc.description.sponsorship
Austrian “Fonds zur F ̈orderungder Wissenschaftlichen Forschung” (FWF)
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dc.language
English
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dc.language.iso
en
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dc.publisher
Springer Science and Business Media
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dc.relation.ispartof
The European physical journal D
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dc.rights.uri
http://creativecommons.org/licenses/by/4.0/
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dc.subject
Plasma physics
en
dc.title
Aspects of thin film deposition on granulates by physical vapor deposition
en
dc.type
Article
en
dc.type
Artikel
de
dc.rights.license
Creative Commons Namensnennung 4.0 International
de
dc.rights.license
Creative Commons Attribution 4.0 International
en
dc.relation.grantno
TRP-281-N20
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dc.rights.holder
The Author(s) 2016
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dc.type.category
Original Research Article
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tuw.peerreviewed
false
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tuw.version
vor
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dcterms.isPartOf.title
The European physical journal D
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tuw.publication.orgunit
E138 - Institut für Festkörperphysik
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tuw.publisher.doi
10.1140/epjd/e2016-70435-7
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dc.identifier.libraryid
AC11361204
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dc.identifier.urn
urn:nbn:at:at-ubtuw:3-2789
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tuw.author.orcid
0000-0002-4145-3351
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tuw.author.orcid
0000-0002-7096-6092
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dc.rights.identifier
CC BY 4.0
de
dc.rights.identifier
CC BY 4.0
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with Fulltext
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open
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en
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research article
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Publications
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Open Access
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item.openairecristype
http://purl.org/coar/resource_type/c_2df8fbb1
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crisitem.author.dept
E138 - Institut für Festkörperphysik
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crisitem.author.dept
E138 - Institut für Festkörperphysik
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crisitem.author.dept
E138 - Institut für Festkörperphysik
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crisitem.author.dept
E138-03 - Forschungsbereich Functional and Magnetic Materials