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Author:  Shawrav, Mostafa Moonir
Author:  Mika, Johann

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PreviewAuthor(s)TitleTypeIssue Date
1Wanzenböck, Heinz D. ; Shawrav, Mostafa Moonir ; Mika, Johann ; Waid, Simon ; Gökdeniz, Z.G. ; Rödiger, Peter ; Bertagnolli, Emmerich Focused Electron Beam Induced Etching - Advantages, Features & Limitations of FEBIE with ChlorineKonferenzbeitrag Inproceedings2015
2Wanzenböck, Heinz D. ; Shawrav, Mostafa Moonir ; Gavagnin, Marco ; Belic, Domagoj ; Rödinger, Peter ; Hochleitner, Gottfried ; Mika, Johann ; Taus, Philip ; Stöger-Pollach, Michael ; Bertagnolli, Emmerich Focused electron beam induced processing (FEBIP) as maskless 3D direct-write nanolithography platformKonferenzbeitrag Inproceedings2015
3Wanzenböck, Heinz D. ; Shawrav, Mostafa Moonir ; Mika, Johann ; Waid, Simon ; Gökdeniz, Z.G. ; Rödinger, Peter ; Bertagnolli, Emmerich Subtractive direct-writing with a focused electron beam - Tailoring monocrystalline semiconductors without carbon contamination by etchingKonferenzbeitrag Inproceedings2015