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Record link: 
http://hdl.handle.net/20.500.12708/75046
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Title: 
Focused Electron Beam Induced Etching - Advantages, Features & Limitations of FEBIE with Chlorine
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Citation: 
Wanzenböck, H. D., Shawrav, M. M., Mika, J., Waid, S., Gökdeniz, Z. G., Rödiger, P., & Bertagnolli, E. (2015). Focused Electron Beam Induced Etching - Advantages, Features & Limitations of FEBIE with Chlorine. In Programme (pp. 1–2). http://hdl.handle.net/20.500.12708/75046
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Publication Type: 
Inproceedings - Poster Contribution
en
Authors: 
Wanzenböck, Heinz D. 
Shawrav, Mostafa Moonir 
Mika, Johann 
Waid, Simon 
Gökdeniz, Z.G. 
Rödiger, Peter 
Bertagnolli, Emmerich 
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Organisational Unit: 
E362 - Institut für Festkörperelektronik 
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Published in: 
Programme 
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Date (published): 
2015
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Event name: 
International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN) 
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Event date: 
27-May-2008 - 30-May-2008
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Event place: 
Portland, USA, Non-EU
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Number of Pages: 
2
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Peer reviewed: 
No
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Science Branch: 
Elektrotechnik, Elektronik, Informationstechnik
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Appears in Collections:
Conference Paper

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