International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN)

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Description

Event name
International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN)
 
Event type
Event for scientific audience
 
Start date
27-05-2008
End date
30-05-2008
 
Location
Portland, USA
Country
 
Event format Veranstaltungsformat
On Site

Publications Publikationen

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Date Issued:  [2000 TO 2024]
Author:  Waid, Simon

Results 1-8 of 8 (Search time: 0.002 seconds).

PreviewAuthor(s)TitleTypeIssue Date
1Waid, Simon ; Wanzenböck, Heinz D. ; Bertagnolli, Emmerich ; Mühlberger, Michael 3D Nano Patterning using Local Ga Implantation and Subsequent RIE EtchPräsentation Presentation2011
2Waid, Simon ; Wanzenböck, Heinz D. ; Bertagnolli, Emmerich Direct Hard Mask Patterning by Focused Ion BeamPräsentation Presentation2011
3Wanzenböck, Heinz D. ; Waid, Simon ; Bertagnolli, Emmerich Fabrication of 3-dimensional Nanoimprint Stamps A comparison of 4 approaches using FIBPräsentation Presentation2012
4Wanzenböck, Heinz D. ; Rödiger, Peter ; Waid, Simon ; Hochleitner, Gottfried ; Bertagnolli, Emmerich Focused Beam Induced Etching - Making the Right Choice Between Ions and ElectronsPräsentation Presentation2011
5Gavagnin, Marco ; Wanzenböck, Heinz D. ; Waid, Simon ; Bertagnolli, Emmerich Focused Electron Beam Induced Deposition as novel nanofabrication approach for magnetic nanosensors and nanomagnet logicPräsentation Presentation2012
6Wanzenböck, Heinz D. ; Shawrav, Mostafa Moonir ; Mika, Johann ; Waid, Simon ; Gökdeniz, Z.G. ; Rödiger, Peter ; Bertagnolli, Emmerich Focused Electron Beam Induced Etching - Advantages, Features & Limitations of FEBIE with ChlorineKonferenzbeitrag Inproceedings2015
7Gavagnin, Marco ; Wanzenböck, Heinz D. ; Waid, Simon ; Bertagnolli, Emmerich Magnetic reversal of iron nanowires deposited by Focused Electron Beam Induced Deposition for nanomagnet logic applicationPräsentation Presentation2012
8Rödiger, Peter ; Wanzenböck, Heinz D. ; Hochleitner, Gottfried ; Waid, Simon ; Bertagnolli, Emmerich Removal of FIB-Induced Amorphization and Gallium Contamination by Focused-Electron-Beam-Induced-EtchingPräsentation Presentation2011