Thin Solid Films

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Journal description

Title Titel
Thin Solid Films
 
e-ISSN
1879-2731
 
ISSN
0040-6090
 
Publisher Herausgeber
ELSEVIER SCIENCE SA
 
Publisher's Address Herausgeber Adresse
PO BOX 564, LAUSANNE, SWITZERLAND, 1001
 
Listed in SCI Aufgelistet im SCI
 
Peer reviewed Begutachtet
 
 

Publications Publikationen

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Date Issued:  [2000 TO 2024]
Author:  Schmid, Ulrich

Results 1-13 of 13 (Search time: 0.003 seconds).

PreviewAuthor(s)TitleTypeIssue Date
1Schmid, U. ; Seidel, H. Effect of High Temperature Annealing on the Electrical Performance of Titanium/Platinum Thin FilmsArtikel Article2008
2Schmid, U. ; Seidel, H. Effect of Substrate Properties and Thermal Annealing on the Resistivity of Molybdenum Thin FilmsArtikel Article2005
3Frischmuth, Tobias ; Schneider, Michael ; Maurer, Daniel ; Grille, Thomas ; Schmid, Ulrich High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin filmsArtikel Article 2016
4Wistrela, E. ; Schmied, I. ; Schneider, M. ; Gillinger, M. ; Mayrhofer, P.M. ; Bittner, A. ; Schmid, U. Impact of sputter deposition parameters on the microstructural and piezoelectric properties of Cr x Al 1−x N thin filmsArtikel Article 2018
5Bohnenberger, Timo ; Schmid, Ulrich Layer-by-layer approach for deposition of pure carbon nanotubes and composite films for use as electrodes in electrochemical devicesArtikel Article2014
6Frischmuth, Tobias ; Schneider, Michael ; Bogdanović Radović, Iva ; Siketić, Zdravko ; Maurer, Daniel ; Grille, Thomas ; Schmid, Ulrich Lowtemperature deposition of a-SiC:H thin films applying a dual plasma source processArtikel Article 2016
7Dergez, D. ; Schneider, M. ; Bittner, A. ; Schmid, U. Mechanical and electrical properties of DC magnetron sputter deposited amorphous silicon nitride thin filmsArtikel Article2015
8Dergez, D. ; Schneider, M. ; Bittner, A. ; Pawlak, N. ; Schmid, U. Mechanical and electrical properties of RF magnetron sputter deposited amorphous silicon-rich silicon nitride thin filmsArtikel Article 2016
9Grosser, Michaela ; Seidel, Helmut ; Schmid, Ulrich Microstructure and Mechanical Properties of Sputter Deposited Tantalum Nitride Thin Films after High Temperature LoadingArtikel Article 2017
10Triendl, F. ; Pfusterschmied, G. ; Fleckl, G. ; Schwarz, S. ; Schmid, U. On the crystallization behavior of sputter-deposited a-Si films on 4H-SiCArtikel Article 2020
11Grosser, M. ; Schmid, U. The impact of sputter conditions on the microstructure and on the resistivity of tantalum thin filmsArtikel Article 2009
12Bohnenberger, Timo ; Rafailovic, Lidija D. ; Weilach, Christian ; Hubmayr, David ; Schmid, Ulrich Thin films from functionalized carbon nanotubes using the layer-by-layer techniqueArtikel Article 2014
13Triendl, Fabian ; Pfusterschmied, Georg ; Berger, Claudio ; Schwarz, Sabine ; Artner, Werner ; Schmid, Ulrich Ti/4H-SiC schottky barrier modulation by ultrathin a-SiC:H interface layerArtikel Article 2021